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Method for preparing photocatalyst with high catalytic reduction activity

A photocatalyst and active technology, applied in the field of photocatalysis, can solve problems such as poor reduction ability, no high activity, strong reduction ability, persistent organic pollution, etc., and achieve easy separation, convenient reuse, and strong controllability Effect

Inactive Publication Date: 2006-02-22
TSINGHUA UNIV
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  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

However, according to the principle of photocatalysis, reducing species such as electrons are simultaneously generated during the photocatalysis process, and photocatalysis technology has a reduction effect at the same time. 2 , CdS, Nb 2 o 5 , ZnO, V 2 o 5 , SnO 2 etc. are all poor in reduction ability, and are limited to the photocatalytic reduction and recovery of heavy metals in heavy metal-polluted wastewater. There is no report on the photocatalyst with strong reduction function that can reduce defluorination and degrade perfluorinated compounds.
In summary, there is currently no photocatalyst with high activity and strong reducing ability, so a photocatalyst capable of catalytic reduction and degradation of persistent organic compounds (such as perfluorinated compounds, PCBs) is needed to solve these persistent organic compounds. The problem of organic pollution

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  • Method for preparing photocatalyst with high catalytic reduction activity
  • Method for preparing photocatalyst with high catalytic reduction activity
  • Method for preparing photocatalyst with high catalytic reduction activity

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preparation example Construction

[0022] The invention provides a method for preparing a photocatalyst with high catalytic reduction activity, such as figure 1 shown, including the following steps:

[0023] 1) For pure Cu and Cu alloy loaded substrates, use acidic aqueous solution to activate pretreatment; for non-Cu and non-Cu alloy loaded substrates, perform sandblasting, thorough degreasing and cleaning pretreatment, and then load after treatment A Cu transition layer with a thickness of at least 5 μm is uniformly plated on the surface of the substrate. Among them, there are various methods of Cu plating, including chemical vapor deposition (PVD) method, physical vapor deposition (PVD) method, electrodeposited Cu plating method, and the like.

[0024] 2) Using the Ni electrodeposition process, uniformly prepare a Ni transition layer with a thickness of 30 μm to 100 μm on the surface of the prepared pure Cu and Cu alloy support substrate or the support substrate with a Cu transition layer to obtain a reduct...

Embodiment 1

[0033] Example 1: Preparation of TiO on a copper substrate 2 -CuO-NiO Thin Film Photocatalyst

[0034] 1) Put a copper sheet with a thickness of 0.4mm into 50g / L Na at 90°C 2 CO 3 Solution, wash for 30 minutes to completely remove oil. Then, at room temperature, put it in 200ml / L concentrated nitric acid aqueous solution for 20 minutes, perform activation (removal of oxide film) pretreatment, and take it out when the surface of the base material shows a uniform metallic luster. Then, rinse them thoroughly in copious amounts of deionized water and dry.

[0035] 2) Preparation of nickel electrodeposition transition layer:

[0036] First, NiSO with a mass concentration of 200g / L 4 ·7H 2 O; 10.5g / L NaCl, 35g / L H 3 BO 3 , 25g / L Na 2 SO 4 10H 2 O, 35g / L MgSO 4 ·7H 2 O is evenly mixed to obtain the plating solution required for electrodepositing nickel with a pH value of 4.0. The electroplated anode Ni plate is cleaned by detergent, and the temperature is 90 ℃ 50g / L Na ...

Embodiment 2

[0041] Example 2: Preparation of TiO on a titanium substrate 2 -CuO-NiO Thin Film Photocatalyst

[0042] 1) Pretreatment of loaded substrate and preparation of Cu transition layer:

[0043] Immerse flake industrial pure titanium with a thickness of 0.5mm in boiling Na 2 CO 3 In the solution (pH=10), keep it for 30 minutes for thorough degreasing treatment, take it out, rinse it, then immerse it in boiling 10% oxalic acid aqueous solution and keep it for 1 hour for activation treatment until the surface of the base material appears uniform dark gray After the pockmarked surface and metallic luster completely disappear, it can be taken out. After rinsing and drying, a uniform Cu transition layer with a thickness of 30 μm is prepared on the above-mentioned pretreated Ti sheet by chemical vapor deposition method, that is, CVD method.

[0044] 2) Preparation of nickel electrodeposition transition layer:

[0045] NiSO with a mass concentration of 250g / L 4 ·7H 2 O, 30g / L NiCl ...

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Abstract

Disclosed is a method for preparation of a photocatalyzer of high catalytic reduction activity, belonging to the art of photocatalysis. In order to decompose effectively the persistence contaminant to the environment such as the perfluorine compounds, the invention discloses a method for preparation of a photocatalyzer: firstly, pretreating the supported base material by deoiling, coating on the surface with a even Cu buffer layer of thicken of more than 5 nano, then, preparing Ni even buffer layer, and the supported substrate material being prepared. At last, preparing TiO2 precursor film on the supported substrate material, and burning by at least 20min in heat treatment device in a random temperature among 300- 600Deg. C, then the supported TiO2- CuO- NiO photocatalyzer of reducing power being prepared. The photocatalyzer prepared with said technique is characterized in that: the reducing activity is high, it is easy to separate and reclaim, the technique is simple, and it is totally suit for batch production.

Description

technical field [0001] The invention relates to a preparation method of a photocatalyst with high catalytic reduction activity in a liquid phase environment, which can be applied to eliminate perfluorinated organic substances in water and soil, and belongs to the technical field of photocatalysis. Background technique [0002] Perfluorinated compounds (PFCs) refer to organic compounds in which the hydrogen (H) connected to the carbon atom (C) in the organic structure is replaced by fluorine (F), such as carbon tetrafluoride (CF 4 ) and perfluorooctane sulfonate (PFOS) - CF 3 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -CF 2 -SO 3 - . Perfluorinated compounds have been used since the 1950s and are used in a wide variety of industrial and consumer products. Among them, PFOS is widely used in industries such as material surface treatment, paper protection, and functional chemical production. In the years before 2000, 4,500 tons of PFOS-related products were produced globall...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J37/025B01J21/06
Inventor 张丽张彭义陈静
Owner TSINGHUA UNIV
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