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Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display

A manufacturing method and a technology of color filters, which are applied in the direction of photolithographic process exposure devices, optical filters, semiconductor/solid-state device manufacturing, etc., can solve problems such as roughness, concave-convex edges, and failure to irradiate multiple beams at the same time

Inactive Publication Date: 2007-06-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that unevenness (rough edges) occurs with respect to the center line at the joint between the pixels of the beam group drawn earlier and the pixels of the beam group described later.
In addition, for the purpose of improving productivity, attempts have been made to increase the beam spot size, but there is a problem that the occurrence of the above-mentioned rough edges becomes more conspicuous.
[0023] Therefore, by simultaneously irradiating a plurality of light beams without using a photomask, a method of manufacturing a color filter that can achieve reduction of unevenness (edge ​​roughness) particularly with respect to the center line and can be formed with high precision has not been provided; and using this The color filter with excellent display characteristics produced by the method of manufacturing the color filter; and the liquid crystal display device using the color filter, the actual situation is to expect further improvement and development

Method used

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  • Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display
  • Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display
  • Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment A-1

[0853] As the pattern forming method of Example A-1, a permanent pattern was formed by the following method, and the obtained pattern was evaluated.

[0854] [Formation of permanent pattern]

[0855]

[0856] 100 parts by mass of tetrahydrophthalic anhydride adduct of the reactant of cresol novolac epoxy resin and acrylic acid, 20 parts by mass of dipentaerythritol hexaacrylate, bisphenol epoxy resin (trade name: YX4000, JAPAN 50 parts by mass of EPOXY RESIN, barium sulfate (trade name: B-30, manufactured by Sakai Chemical Co., Ltd.) 90 parts by mass, diethylthioxanthone (trade name: DETX-S, manufactured by Nippon Kayaku Co., Ltd.) 1 mass 15 parts by mass, 15 parts by mass of dimethylmorpholinomethyl-p-methylthiophenylketone (trade name: IRGACURE 907, manufactured by CIBA SPECIALTY CHEMICALS), 0.3 parts by mass of dicyandiamide, and 1 part by mass of phthalocyanine green The composition of the constitution was mixed with three rolling mills to prepare a photosensitive compo...

Embodiment A-2

[0882] [Formation and evaluation of permanent patterns]

[0883] Except based on 50.00 parts by mass of barium sulfate (manufactured by Sakai Chemical Co., Ltd., B30), styrene / maleic anhydride / butyl acrylate copolymer (molar ratio 40 / 32 / 28) and benzylamine (relative to the acid anhydride group of the copolymer) 81.70 parts by mass of 35% by mass methyl ethyl ketone solution, 13.16 parts by mass of dipentaerythritol hexaacrylate, 6.82 parts by mass of IRGACURE 907 (manufactured by CIBA SPECIALTYCHEMICALS Co., Ltd.), YX4000 (manufactured by JAPAN EPOXY RESIN Co., Ltd. , epoxy resin) 20.00 parts by mass, RE306 (manufactured by Nippon Kayaku Corporation, epoxy resin) 5.00 parts by mass, 0.13 parts by mass of dicyandiamide, 0.024 parts by mass of hydroquinone monomethyl ether and 0.42 parts by mass of phthalocyanine green The permanent pattern of Example A-2 was formed similarly to the permanent pattern formation method of Example A-1 except having prepared the photosensitive compo...

Embodiment A-3

[0889] [Formation and evaluation of permanent patterns]

[0890]Based on methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer [copolymer composition (molar ratio): 40 / 26.7 / 4.5 / 28.8, molecular weight: 90000, Tg: 50°C] 15 parts by mass, 6.5 parts by mass of dodecapropylene glycol diacrylate, 1.5 parts by mass of tetraethylene glycol dimethacrylate, 0.4 parts by mass of 4,4'-bis(diethylamino)benzophenone, 3.0 parts by mass of benzophenone, 0.5 parts by mass of 4-toluenesulfonamide, 0.02 parts by mass of malachite green oxalate, 0.01 parts by mass of 1,2,4-triazole, 0.2 parts by mass of colorless crystal violet, tribromoform A photosensitive composition (solution) was prepared with a composition consisting of 0.1 parts by mass of phenyl sulfone, 15 parts by mass of methyl ethyl ketone, and 35 parts by mass of 1-methoxy-2-propanol.

[0891] Then, the obtained photosensitive composition was coated on a copper-clad laminate (copper thickness: 12 μ...

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Abstract

The present invention provides a pattern forming method capable of forming fine patterns with high precision, improving the productivity of pattern formation, and forming a predetermined pattern in a photosensitive composition with high resolution. For this purpose, it includes: using a photosensitive composition containing a binder, a polymerizable compound, and a photopolymerization initiator to form a photosensitive layer on the surface of a substrate; A natural number greater than 2) The light modulation mechanism of the drawing part that receives the light from the light irradiation mechanism and emits it. The light of the microlens array of the aspherical microlens of the aberration caused by the deformation, or the microlens that passes through the array of microlenses having a lens opening shape that does not allow the light from the peripheral part of the drawing part to enter The array light is an exposure step of exposing the photosensitive layer formed in the photosensitive layer forming step in an oxygen-poor atmosphere; and a developing step of developing the photosensitive layer exposed in the exposure step.

Description

technical field [0001] The present invention relates to a pattern forming method in which light modulated by a light modulation mechanism such as a spatial light modulation element forms an image on a pattern forming material and exposes the pattern forming material; and a method of manufacturing a color filter; Color filters for liquid crystal display devices (LCD) such as portable terminals, portable game machines, notebook personal computers, and TV monitors, PALC (plasma addressed liquid crystal), plasma displays, etc., and liquid crystals using the same display device. Background technique [0002] In general, photolithography is known as a method for forming a fine pattern by exposing and developing a photosensitive composition. [0003] Conventionally, as an exposure apparatus for performing the photolithography method, an exposure apparatus utilizing a laser direct imaging system (hereinafter sometimes referred to as “LDI”) in which a semiconductor laser, a gas lase...

Claims

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Application Information

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IPC IPC(8): G03F7/20G02B5/20G03F7/004H01L21/027
Inventor 岩崎政幸石川弘美下山裕司儿玉知启
Owner FUJIFILM CORP
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