Method for preparing dense fluoride ceramic films on magnesium surface and magnesium alloy surface
A technology of magnesium alloy and fluoride, which is applied in the direction of surface reaction electrolytic coating, anodic oxidation, metal material coating technology, etc., can solve the problem of high content of MgO in the oxide film, and achieve the effect of good bonding, low equipment and uniform thickness
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Embodiment 1
[0022] 1. Material preparation: Pure magnesium is cleaned and degreased by ultrasonic cleaning in acetone solution after cutting and grinding.
[0023] 2. Chemical passivation: in the passivation solution, 85% (volume concentration) H 3 PO 4 5ml / L, NH 4 HF 2 100g / L, the rest is water. The temperature is 10-35°C, and the treatment is for 20-30 seconds. Immediately after taking it out, wash it with tap water for 1-2 minutes, and then wash it with deionized water for 1-2 minutes. The thickness of the passivation film is 1nm.
[0024] 3. Preparation of single-pulse micro-arc oxidation film: NaF 20g / L, HF 5ml / L, C 6 h 5 o 7 Na 3 2g / L, NaH 2 PO 4 5g / L, the rest is water. pH=3.5~4.0, temperature 30°C, treatment for 10 minutes, power supply mode: single forward, final oxidation voltage 320V, current density 3A / dm 2 , frequency 500Hz, duty cycle 10 -3 ms, the thickness of the oxide film in this embodiment is about 10um.
[0025] 4. Double-pulse micro-arc oxidation film pre...
Embodiment 2
[0029] 1. Material preparation: After AZ31B magnesium alloy is cut and polished, use ultrasonic cleaning in acetone solution to remove oil.
[0030] 2. Chemical passivation: in the passivation solution, 85% H 3 PO 4 2~5ml / L, the rest is water. The temperature is 40-70°C, and it is treated for 0.5-5 minutes. Immediately after taking it out, it is washed with tap water for 1-2 minutes, and then with deionized water for 1-2 minutes. The thickness of the passivation film is 2nm.
[0031] 3. Preparation of single-pulse micro-arc oxidation film: NaF 15g / L, H 3 PO 4 5ml / L, C 4 h 4 o 6 Na 2 2H 2 O 2g / L, Na 2 HPO 45g / L, the rest is water. pH=3.5~4.0, temperature 20°C, treatment for 10 minutes, power supply mode: single forward, final oxidation voltage 300V, current density 3A / dm 2 , frequency 800Hz, duty cycle 10 -3 ms, the thickness of the oxide film in this embodiment is about 10um.
[0032] 4. Double-pulse micro-arc oxidation film preparation: NaF 15g / L, H 3 PO 4 5ml...
Embodiment 3
[0036] 1. Material preparation: After AZ91D magnesium alloy is cut and polished, use ultrasonic cleaning in acetone solution to degrease.
[0037] 2. Chemical passivation: In the passivation solution, HF is 30ml / L, and the rest is water. The temperature is room temperature, and the treatment time is 30 seconds. Immediately after taking it out, wash it with tap water for 1-2 minutes, and then wash it with deionized water for 1-2 minutes. The thickness of the passivation film is 1mm.
[0038] 3. Preparation of single-pulse micro-arc oxidation film: KF 30g / L, HF 3ml / L, C 6 h 5 o 7 K 3 2H 2 O 3g / L, K 5 P 3 O106g / L, the rest is water. pH=3.5~4.0, temperature 40℃, treatment for 10 minutes, power supply mode: single forward, final oxidation voltage 350V, current density 2A / dm 2 , frequency 1000Hz, duty cycle 10 -3 ms, the thickness of the oxide film in this embodiment is about 10um.
[0039] 4. Preparation of double-pulse micro-arc oxidation film: KF 30g / L, HF 3ml / L, C 6 h...
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