Preparation method of ZnS-cladded ZnO nanoarray core-shell structure
A nano-array, core-shell structure technology, applied in sputtering plating, ion implantation plating, final product manufacturing, etc., to achieve the effect of improving transmission capacity, stable deposition rate, and good repeatability
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[0027] 1. Cleaning of glass substrate
[0028] Carry out surface cleaning treatment on the FTO conductive glass, put in triton aqueous solution, acetone solution, absolute alcohol solution and deionized water in sequence for 15 minutes, and then dry the FTO substrate.
[0029] 2. Preparation of ZnO seed crystals
[0030] ZnO seeds were prepared by magnetron sputtering. The target material is Al-doped 2 o 3 ZnO target (AZO target), in which ZnO is 98wt%, Al 2 o 3 is 2wt%. The magnetron sputtering condition is: the background vacuum is 5×10 -4 Pa, the working pressure is 0.4Pa, the radio frequency sputtering power is 150W, and the sputtering time is 20min. The seeds were heat-treated in a rapid annealing furnace in N 2 It is carried out in the atmosphere, the temperature is 400°C, and the time is 20 minutes.
[0031] 3. Growth of ZnO nanoarrays
[0032] ZnO nanoarrays were grown by hydrothermal method. The growth solution is an aqueous solution of 0.05mol / L zinc nitra...
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