Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Radiation synthesis method for chelate adsorption materials

A technology of chelation adsorption and synthesis method, which is applied in the direction of chemical instruments and methods, adsorption water/sewage treatment, water/sludge/sewage treatment, etc., which can solve the problems of affecting the adsorption and desorption speed, the increase of recovery cost, and the limited adsorption capacity, etc. problem, to achieve the effect of shortening the reaction time, reducing environmental load, and high reaction efficiency

Inactive Publication Date: 2013-01-16
HUBEI UNIV OF SCI & TECH
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This kind of resin material has the advantages of good chemical stability and high mechanical strength, but at the same time there are many problems: for example, the substrate is a cross-linked body of hydrophobic polymer material, which affects its affinity with the adsorption object, and because the adsorption group It mainly exists inside the resin, and the diffusion speed of metal ions in the resin ball is slow, which affects its adsorption and desorption speed; and because the above-mentioned resin materials are expensive, the adsorption capacity is limited when dealing with low-concentration metal waste liquid, and the use of these resin materials will cause Increased recovery costs
[0004] After searching, there is no patent application identical to the present invention in China

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Polyethylene resin particles (average diameter 100 left and right) as the polymer substrate, the 10g The above materials are placed in a nitrogen-containing PE bag, and irradiated by a high-energy electron accelerator to generate active free radicals that can be used for grafting reactions. The irradiation condition is the radiation voltage 2MeV , the radiation dose is 200 kGy , dose rate 10 kGy / pass ; The above-mentioned particles after radiation are immediately put into the 35% GMA, 3.5% Polyoxyethylene Sorbitan Monolaurate (Tween20) and 61.5% In the emulsion reaction system composed of water, GMA The emulsified reaction system of the monomer is continuously blown in before use 30min Nitrogen, to discharge the oxygen in the water, graft polymerization reaction in 50℃ conduct 2h . The polymer obtained under the above conditions for grafting reaction: the grafting ratio of polyethylene substrate 200% .

[0023] abovementioned GMA Monomer grafted produ...

Embodiment 2

[0025] Polyethylene resin particles (average diameter 100 left and right) as the polymer substrate, the 10g The above materials are placed in a nitrogen-containing PE bag, and irradiated by a high-energy electron accelerator to generate active free radicals that can be used for grafting reactions. The irradiation condition is the radiation voltage 2MeV , the radiation dose is 200 kGy , dose rate 10 kGy / pass ; The above-mentioned particles after radiation are immediately put into the 35% GMA, 3.5% Polyoxyethylene Sorbitan Monolaurate (Tween20) and 61.5% In the emulsion reaction system composed of water, GMA The emulsified reaction system of the monomer is continuously blown in before use 30min Nitrogen, to discharge the oxygen in the water, graft polymerization reaction in 50℃ conduct 2h . Obtain the polymer of grafting reaction under the above-mentioned conditions: The grafting rate of polyethylene substrate 200% .

[0026] abovementioned GMA Monomer grafted...

Embodiment 3

[0028] The development product 1 prepared by embodiment 1 and embodiment 2, the development product 2---chelating adsorption resin material (using the substrate as the adsorption material of PE) and commercially available cross-linked polystyrene as the resin substrate, The commercial resin whose iminodiacetic acid group is the adsorption functional group (resin name CR11, produced by Mitsubishi Chemical Corporation), each weighed 0.1g Separately put in at room temperature 100ml Batch adsorption tests were carried out in solutions of various common heavy metals. The heavy metal solution used in the adsorption test is prepared by diluting a commercially available standard solution with PH4 acetate buffer solution, and the initial concentration is adjusted to 10ppm , the adsorption test was stirred at room temperature 24h , recover its supernatant, analyze its residual metal concentration with ICP spectrometer to calculate its adsorption rate and evaluate its adsorption charact...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
degree of graftingaaaaaaaaaa
degree of graftingaaaaaaaaaa
Login to View More

Abstract

The invention provides a radiation synthesis method for chelate adsorption materials, relates to a preparation method of high-polymer adsorption resin, and in particular to a radiation synthesis method for chelate adsorption materials to divalent and trivalent harmful metal cations in water. The radiation synthesis method includes irradiating high-polymer substrate by ionizing radiation to generate active radical; subjecting radiated high-polymer substrate and glycidyl methacrylate intermediate monomer to graft polymerization reaction; and introducing function groups such as imino group diacetoxyl and phosphate group which are easy to form chelate with divalent and trivalent metal cations in water by epoxy ring-opening reaction so as to obtain chelate adsorption resin. The synthesis method is high in grafting efficiency and low in environmental load, and graft products do not contain organic solvents, synthetic products have high-speed efficient adsorption capacity, service cost is reduced, comprehensive economical benefit is remarkable, and the synthetic products are particularly suitable for efficient adsorption to divalent and trivalent metal ions in water in low-concentration environments, and can be popularized and used as the chelate adsorption materials to divalent and trivalent harmful metal cations in water.

Description

technical field [0001] The invention relates to a preparation method of a polymer adsorption resin, in particular to a radiation synthesis method of a chelating adsorption material for harmful divalent and trivalent metal cations in water. Background technique [0002] The removal of harmful metal ions in water is an important issue in the treatment of various industrial wastewater; and some metal ions need to be recycled and reused as useful resources. For the recovery of low-concentration metal ions, ion-exchange resins or chelating resins with polystyrene cross-linked bodies forming the resin skeleton are often used. This kind of resin material has the advantages of good chemical stability and high mechanical strength, but at the same time there are many problems: for example, the substrate is a cross-linked body of hydrophobic polymer material, which affects its affinity with the adsorption object, and because the adsorption group It mainly exists inside the resin, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/26B01J20/30C02F1/28C02F1/62C08J7/12C08J7/18C08L23/06
Inventor 赵龙李月生张光学杜纪富黄亚琼孙绍发
Owner HUBEI UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products