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Preparation method for diamond particles deposited with WC/W (wolfram carbide/wolfram) composite coating on surfaces

A diamond particle and composite coating technology, which is applied in coatings, metal processing equipment, grinding/polishing equipment, etc., can solve the problems that titanium trichloride is easy to pollute the environment, lose its industrial application value, and reduce the strength of diamonds. Good compatibility, no pretreatment process, and improved performance

Inactive Publication Date: 2013-10-16
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Ordinary physical vapor deposition includes thermal evaporation plating, magnetron sputtering plating, ion plating, etc. There are complex processes, a small amount of single plating, and only physical adhesion between the plating layer and the diamond after plating without forming carbides with the diamond surface, etc. The problem is that it is difficult to bond a large area of ​​compounds in a short time of hot pressing in tool manufacturing, so the effect of using it is not obvious
However, the simple metal powder coating chemical vapor deposition and salt bath coating methods, the diamond is heated to more than 850°C during the coating process, even under high vacuum conditions, the strength of the diamond will be significantly reduced, and the industrial application value will be lost.
Vacuum micro-evaporation plating technology, which is widely used at present, also requires high deposition temperature, and the types of plating are limited (only limited to Ti plating), and the raw materials used contain certain toxic elements such as titanium trichloride, which is easy to pollute the environment.

Method used

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  • Preparation method for diamond particles deposited with WC/W (wolfram carbide/wolfram) composite coating on surfaces
  • Preparation method for diamond particles deposited with WC/W (wolfram carbide/wolfram) composite coating on surfaces
  • Preparation method for diamond particles deposited with WC/W (wolfram carbide/wolfram) composite coating on surfaces

Examples

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Effect test

Embodiment 1

[0026] A preparation method for depositing a WC / W composite coating on the surface of diamond particles, the main preparation process steps are:

[0027] (1) First put the diamond particles into 10% HNO by weight 3 Boil and rinse in 5% NaOH solution for cleaning and roughening pretreatment. The treated diamond particles are placed in a tray in a double cathode plasma sputtering deposition furnace.

[0028] (2) Subsequent double-cathode plasma sputtering deposition to prepare WC / W nanocomposite coatings. The parameters of the double-cathode plasma sputtering deposition process are as follows: 820V, current 3.5A, tray voltage 360V, distance between target and tray 10mm, working pressure of argon, air pressure 32Pa, tray temperature 600°C, deposition time 2 hours.

[0029] c. The type of sputtering target: W with a purity of 99.9%;

[0030] d. The type of workpiece material: diamond particles

[0031] The grain size of the WC layer of the obtained nano coating is 30-40nm, the...

Embodiment 2

[0033] A preparation method for depositing a WC / W composite coating on the surface of diamond particles, the main preparation process steps are:

[0034] (1) First put the diamond particles into 10% HNO by weight 3 Boil and rinse in 5% NaOH solution for cleaning and roughening pretreatment. The treated diamond particles are placed in a tray in a double cathode plasma sputtering deposition furnace.

[0035] (2) Subsequent double-cathode plasma sputtering deposition to prepare WC / W nanocomposite coatings. The parameters of the double-cathode plasma sputtering deposition process are as follows: 950V, current 3.8A, tray voltage 420V, distance between target and tray 16mm, working pressure of argon, air pressure 35Pa, tray temperature 600°C, deposition time 2 hours.

[0036] c. The type of sputtering target: W with a purity of 99.9%;

[0037] d. The type of workpiece material: diamond particles

[0038] figure 1It is the SEM photo of the WC / W nanocomposite coating prepared on ...

Embodiment 3

[0040] A preparation method for depositing a WC / W composite coating on the surface of diamond particles, the main preparation process steps are:

[0041] a. First put the diamond particles into 10% HNO by weight 3 Boil and rinse in 5% NaOH solution for cleaning and roughening pretreatment. The treated diamond particles are placed in a tray in a double cathode plasma sputtering deposition furnace.

[0042] b. Subsequent double-cathode plasma sputtering deposition to prepare WC / W nanocomposite coatings. The parameters of the double-cathode plasma sputtering deposition process are as follows: 1000V, current 4.6A, tray voltage 400V, distance between target and tray 16mm, working pressure of argon, gas pressure of 35Pa, tray temperature of 600°C, and deposition time of 2 hours.

[0043] c. The type of sputtering target: W with a purity of 99.9%;

[0044] d. The type of workpiece material: diamond particles

[0045] The grain size of the obtained nano-coating WC layer is 35-50 n...

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Abstract

The invention discloses a preparation method for diamond particles deposited with a WC / W (wolfram carbide / wolfram) composite coating on the surfaces. According to the preparation method, the WC / W nano-composite coating is synthesised on the surfaces of the diamond particles by realizing a primary treatment via a dual-cathode plasma sputtering deposition method, and WC in the coating is formed via an interface in-situ reaction between W and the surfaces of the diamond particles during a dual-cathode plasma sputtering deposition process. According to the preparation method disclosed by the invention, the bonding strength and a holding force between the diamond particles and a metal binder, and the compressive strength of the diamond particles are obviously improved. In addition, the WC / W nano-composite coating deposited on the surfaces of the diamond particles has a protective effect on the diamond particles, thus preventing diamond from being oxidized and graphitized during high-temperature sintering and high-temperature grinding processes. The WC / W nano-composite coating in the preparation method disclosed by the invention is mainly suitable for manufacturing a diamond tool by taking a W-Co hard alloy as a matrix, and the diamond tool obtains a high exposure, thus improving the grinding sharpness and the machining efficiency of a grinding tool, and obviously prolonging the service life of the grinding tool.

Description

technical field [0001] The invention relates to diamond particles and belongs to the new technical field of diamond particle surface coating. The invention is especially suitable for diamond tools based on W-Co cemented carbide. It mainly involves double-cathode plasma sputtering deposition technology, interface reaction in-situ synthesis and types of deposition materials. Background technique [0002] Due to a series of excellent physical and chemical properties such as high hardness, high strength, high wear resistance and small linear expansion coefficient, diamond has been widely used in the field of grinding processing. For example, it can manufacture a variety of tools such as knives, grinding wheels, Abrasives, etc. Diamond tools are usually made of diamond particles as cutting materials, with the aid of binders and other auxiliary materials with certain shapes, properties and uses. Due to the characteristics of diamond itself, it is not infiltrated with convention...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/36C23C14/18C23C14/06B24D18/00
Inventor 徐江揭晓华陶洪亮王国栋
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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