Special cleaning solution for high-performance photovoltaic silicon chips

Abstract

The invention discloses a special cleaning solution for high-performance photovoltaic silicon chips, which is composed of high-polymer carboxylic acid, organic amine, a surfactant, a complexing agent, a corrosion inhibitor, other assistants and water. The cleaning solution has the advantages of excellent cleaning performance, high use safety and environmental protection.

Description

technical field [0001] The invention relates to a photovoltaic silicon chip cleaning solution. Background technique [0002] In solar photovoltaic enterprises, in order to ensure the electrical performance, reliability and yield of cells, the silicon wafers after the previous wire cutting process must first be roughly cleaned, and the organic substances adsorbed on the surface of the silicon wafers in physical form (grease, grease, Rosin, epoxy resin, polyethylene glycol, etc.), dust particles, and metal ion impurities that exist in the oxide film of the silicon wafer itself in chemical form are removed without damaging the silicon wafer or causing re-precipitation and Contamination again. The cleaning method is first to remove the organic contamination and dust particles on the surface of the silicon wafer, and then to dissolve the oxide film and remove the metal ion impurities. The requirements for cleaning fluid are firstly that the cleaning performance (cleaning effici...

AI Technical Summary

Problems solved by technology

Due to many reasons behind the technology and technology, the current commercially available cleaning agents for silicon wafers are generally unsatisfactory

First, the cleaning efficiency is low (8S), and the cleaning performance and penetration performance are poor; the second is that the pH value is high (>11), resulting in more prominent corrosion damage to silicon wafers; the third is that the formula contains sodium hypochlorite , organic solvents and other irritating odors or toxic substances, poor safety and hygiene quality; fourth, the cleaning process is single, and needs to be heated to above 40°C before use (consumption of energy)