Tb, Mn and Ni ternary co-doped low leakage current BiFeO3 film and preparation method thereof
A technology of leakage current and co-doping, applied in chemical instruments and methods, inorganic chemistry, iron compounds, etc., can solve the problems of low dielectric constant, low resistivity, large leakage current, etc., to improve the performance of multiferroics, improve Effect of magnetic properties and enhanced insulation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0024] 1) Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 )3 9H 2 O, Tb(NO 3 ) 3 ·6H 2 O, C 4 h 6 MnO 4 4H 2 O and C 4 h 6 NiO 4 4H 2 O is dissolved in the mixed solution formed by mixing ethylene glycol methyl ether and acetic anhydride at a molar ratio of 0.94:0.95:0.11:0.04:0.01, and then stirred for 2 hours to make it uniform to obtain BiFeO 3 Precursor; Among them, BiFeO 3 The total metal ion concentration in the precursor solution is 0.3mol / L; the volume ratio of ethylene glycol methyl ether and acetic anhydride in the mixed solution is 3:1;
[0025] 2) BiFeO 3 The precursor solution was left to stand for 24h, and then spin-coated BiFeO on the FTO / glass substrate 3 The wet film was prepared from the precursor solution, and the wet film was baked at 200°C for 6 minutes to obtain a dry film, and then rapidly annealed at 550°C for 8 minutes to obtain crystalline BiFeO 3 film.
[0026] 3) To be crystalline BiFeO 3 After film cooling, repeat step 2) to make crystalline BiFeO...
Embodiment 2
[0028] 1) Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 9H 2 O, Tb(NO 3 ) 3 ·6H 2 O, C 4 h 6 MnO 4 4H 2 O and C 4 h 6 NiO 4 4H 2 O was dissolved in the mixed solution of ethylene glycol methyl ether and acetic anhydride at a molar ratio of 0.94:0.94:0.11:0.04:0.02, and stirred for 2 hours to make it uniform, to obtain BiFeO 3 Precursor; Among them, BiFeO 3 The total metal ion concentration in the precursor solution is 0.3mol / L; the volume ratio of ethylene glycol methyl ether and acetic anhydride in the mixed solution is 3:1;
[0029] 2) BiFeO 3 The precursor solution was left to stand for 32h, and then spin-coated BiFeO on the FTO / glass substrate 3 The wet film was prepared from the precursor solution, and the wet film was baked at 200°C for 12 minutes to obtain a dry film, and then rapidly annealed at 550°C for 10 minutes to obtain crystalline BiFeO 3 film;
[0030] 3) To be crystalline BiFeO 3 After film cooling, repeat step 2) again until crystalline BiFeO 3 The f...
Embodiment 3
[0037] 1) Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 9H 2 O, Tb(NO 3 ) 3 ·6H 2 O, C 4 h 6 MnO 4 4H 2 O and C 4 h 6 NiO 4 4H 2 O was dissolved in the mixed solution of ethylene glycol methyl ether and acetic anhydride in a molar ratio of 0.97:0.94:0.08:0.04:0.02, and stirred for 2 hours to make it uniform, to obtain BiFeO 3 Precursor; Among them, BiFeO 3 The total metal ion concentration in the precursor solution is 0.1mol / L; the volume ratio of ethylene glycol methyl ether and acetic anhydride in the mixed solution is 4:1;
[0038] 2) BiFeO 3 The precursor solution was left to stand for 28h, and then spin-coated BiFeO on the FTO / glass substrate 3 The wet film was prepared from the precursor solution, and the wet film was baked at 180°C for 8 minutes to obtain a dry film, and then rapidly annealed at 550°C for 13 minutes to obtain crystalline BiFeO 3 film;
[0039] 3) To be crystalline BiFeO 3 After film cooling, repeat step 2) again until crystalline BiFeO 3 The fi...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
current density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com