Novel electrode material with surface subjected to molybdenum infiltration and titanium nitride deposition and preparation method thereof
An electrode material, titanium nitride technology, applied in the direction of electrode, metal material coating process, electrolysis process, etc., can solve the problems of large power consumption, non-corrosion resistance, poor conductivity, etc., and achieve stable power consumption, low cost, high resistance small effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0016] The present invention is further illustrated below by specific examples.
[0017] The base material used is 20 steel, the size is 100 mm×25 mm×8 mm (length×width×thickness), the sample is polished and polished to a surface roughness of Ra=0.8um; the source of molybdenum infiltration is very plate-shaped, and its size is: 100 mm×50 mm×5 mm (length×width×thickness), the purity is 99.9%; the working gas is argon with a purity of 99.99%, and the reaction gas is nitrogen with a purity of 99.99%.
[0018] Grind and polish the treated substrate with different types of water abrasives, then clean it with ultrasonic waves and dry it. The plate is centered, and the substrate to be processed is placed on both sides of the source molybdenum plate. After vacuuming to the ultimate vacuum of the equipment 1.2Pa, a small amount of argon gas is filled to 15Pa, and the voltage of the source and the workpiece is adjusted for ion bombardment. After 10 minutes, gradually adjust Source volt...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com