Micro-fluorine glass etching and polishing method

A technology of etching and polishing and micro-fluorine glass, which is applied in the field of glass etching and polishing and micro-fluorine glass etching and polishing, to achieve the effects of high safety, fast etching rate and large depth

Active Publication Date: 2014-09-17
陈锋
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to replace the traditional technology of directly etching the glass surface with hydrofluoric acid with a green and environmental protection micro-fluorine catalytic cycle e

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  • Micro-fluorine glass etching and polishing method

Examples

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Effect test

example 1

[0016] Sodium fluoride (inorganic salt 1) and sodium sulfate (inorganic salt 2) were ground separately, and then mixed with sodium dihydrogen phosphate and water in a weight ratio of 10:8:1:1 to prepare an etching solution. Then apply the etchant to the pretreated glass. After standing at 25°C for 1 hour, the glass surface was cleaned. The surface morphology was observed by scanning electron microscope. Pretreatment steps: ultrasonic washing (low frequency) - acid washing (mixture of dichromic acid and sulfuric acid in any proportion) - immersion in organic solvent acetone for 3 minutes - distilled water washing - heating - sticking a protective layer.

[0017] Such as figure 1 , It was found that the etching surface was uneven, the surface was whitish, there was side etching, and the etching depth was very small.

[0018] Experimental data: 17.4801 grams before etching and 17.4431 grams after etching

[0019] Erosion depth: m before etching - m after etching = 17.4801-17...

example 2

[0021] ① Grind sodium fluoride and sodium sulfate separately, and make an etching solution with sodium dihydrogen phosphate, water and starch (to adjust the viscosity of the solution) in a ratio of 10:8:1:1:5, and then mix the etching solution Apply to pre-treated glass. After standing at 28OC for 1 hour, the glass surface was cleaned. The surface morphology was observed by scanning electron microscopy, such as figure 2 .

[0022] Experimental data: 17.0375 grams before etching; 17.4063 grams after etching;

[0023] Erosion depth: m before etching - m after etching = 17.0375-17.4063 = 0.0375;

[0024] ②Grind sodium fluoride and sodium sulfate separately, and make an etching solution with sodium dihydrogen phosphate, water and starch (to adjust the viscosity of the solution) in a ratio of 10:8:1:6:5, and then mix the etching solution Apply to pre-treated glass. After being placed at 28OC for 1 hour, the glass surface was cleaned and its surface morphology was observed wit...

example 3

[0029] ①After grinding sodium fluoride and sodium sulfate separately, make etching solution with sodium dihydrogen phosphate, water, and active agent sodium tetraborate in a ratio of 10:8:1:1:5, and then apply the etching solution on the pretreatment After the good glass is placed at 28OC for 1 hour, the glass surface is cleaned. The surface morphology was observed by scanning electron microscopy, such as Figure 4 .

[0030] Experimental data: 17.2908 grams before etching; 17.1773 grams after etching;

[0031] Erosion depth: m before etching - m after etching = 17.2908-1773 = 0.1135;

[0032] ②Grind sodium fluoride and sodium sulfate separately, and make an etching solution with sodium dihydrogen phosphate, water, and active agent sodium tetraborate at a ratio of 10:8:1:6:5, and then apply the etching solution on the pre- Treated glass. After standing at 28OC for 1 hour, the glass surface was cleaned. The surface morphology was observed by scanning electron microscopy, s...

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Abstract

The invention discloses a micro-fluorine glass etching and polishing method comprising the following steps: respectively grinding sodium fluoride and sodium sulfate, and then, mixing sodium fluoride, sodium sulfate, sodium dihydrogen phosphate, water and an active agent at a weight ratio of 10:(7-8):1:(5-6):5 to prepare an etching solution, and etching. Compared with the prior art, the micro-fluorine glass etching and polishing method has the advantages that firstly, a great deal of hydrofluoric acid is prevented from being directly used, and the used medicines are simple in recovery and can be completely recycled; secondly, the micro-fluorine glass etching and polishing method is high in etching speed, large in etching depth, good in etching uniformity, high in safety and capable of meeting the production and application requirements; thirdly, the environment protection and sustainable development concepts are achieved, the requirement for clean production is met, and the wastewater treatment method designed for the technology is used for ensuring that the treated wastewater can be up to the natural discharge standard.

Description

technical field [0001] The invention relates to glass etching and polishing technology in the field of chemical processing, in particular to a method for etching and polishing microfluorine glass. Background technique [0002] The finishing of glass workpieces such as glass instruments, instruments, and electronic material display screens is the need of current scientific development. How to improve the precision and accuracy of glass workpieces is the main topic for professional researchers. In particular, glass workpieces in the display of electronic materials require high-precision and high-accuracy etching technology to complete. The traditional hydrofluoric acid-sulfuric acid etching technology is on the verge of being eliminated due to serious environmental pollution. Glass etching technology has emerged as the times require. Mainly include: ammonium fluoride-sulfuric acid method, sodium fluoride-sulfuric acid method, ammonium fluoride-hydrochloric acid method, etc. A...

Claims

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Application Information

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IPC IPC(8): C03C15/00
Inventor 刘存海张佳
Owner 陈锋
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