A kind of preparation method of titanium dioxide nano film
A nano-film, titanium dioxide technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of poor adhesion between the film and the substrate, long occupation time, easy cracking of the film, etc. The effect of low cost, improved quality and simple equipment
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Embodiment 1
[0038] Add 0.0125mol nano-titanium dioxide powder (particle size 25 nanometers) and 2.6*10 to 1000ml deionized water -4 mol active surfactant Y(NO 3 ) 3 •6H 2 O. Under the JY92-II ultrasonic cell pulverizer, stir for 30 minutes at 30°C, 2% intensity, and interval of 5 seconds to form a titanium dioxide dispersion deposition solution. After standing for 12 hours, it was used for electric field deposition.
[0039] After rinsing the deposition substrate 2 times with deionized water, immerse the deposition substrate 4 in acetone and alcohol, respectively, and clean it ultrasonically for 20 minutes, then take out the deposition substrate 4 and put it into deionized water, and clean it ultrasonically for 10 minutes. Soak in 2M dilute hydrochloric acid for 5 minutes before use. Then, put in figure 1 Shown is contained in the glass container in the electric field deposition apparatus of the titanium dioxide dispersed deposition solution prepared above. The distance between the...
Embodiment 2
[0043] In 1000ml deionized water, add 0.0125mol nano-titanium dioxide powder (particle size 40 nanometers) and 2.6*10 -4 mol active surfactant Y(NO 3 ) 3 •6H 2 O. Under the JY92-II ultrasonic cell pulverizer, stir for 30 minutes at 30°C, 2% intensity, and interval of 5 seconds to form a titanium dioxide dispersion deposition solution. After standing for 12 hours, it was used for electric field deposition.
[0044] After rinsing the deposition substrate 3 times with deionized water, the deposition substrate 4 was respectively immersed in acetone and alcohol and cleaned by ultrasonic waves for 20 minutes, and then the deposition substrate 4 was taken out and put into deionized water and cleaned by ultrasonic waves for 10 minutes. Soak in 2M dilute hydrochloric acid for 5 minutes before use. Then, put in figure 1 Shown is contained in the glass container in the electric field deposition apparatus of the titanium dioxide dispersed deposition solution prepared above. The dis...
Embodiment 3
[0047] In 1000ml deionized water, add 0.0125mol nano-titanium dioxide powder (particle size 20 nanometers) and 5.8*10 -4 mol active surfactant Y(NO 3 ) 3 •6H 2 O. Under the JY92-II ultrasonic cell pulverizer, stir for 10 minutes at 30°C, 2% intensity, and interval of 5 seconds to form a titanium dioxide dispersion deposition solution. After standing for 12 hours, it was used for electric field deposition.
[0048] After rinsing the deposition substrate 3 times with deionized water, the deposition substrate 4 was respectively immersed in acetone and alcohol and cleaned by ultrasonic waves for 20 minutes, and then the deposition substrate 4 was taken out and put into deionized water and cleaned by ultrasonic waves for 10 minutes. Soak in 2M dilute hydrochloric acid for 5 minutes before use. Then, put in figure 1 Shown is contained in the glass container in the electric field deposition apparatus of the titanium dioxide dispersed deposition solution prepared above. The dis...
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