Liquid crystal panel copper-molybdenum membrane etching liquid

Abstract

The invention relates to a liquid crystal panel copper-molybdenum membrane etching liquid. According to the total weight, the copper-molybdenum membrane etching liquid comprises the following components in percentage by weight: 1-20 percent of hydrogen peroxide, 0.01-8 percent of a hydrogen peroxide stabilizer, a pH regulator prepared by mixing 1-8 percent of ammonia water and 1-7 percent of organic phosphinate, 0.1-12 percent of a chelating agent, 0.1-5 percent of a metal corrosion inhibitor and the balance of water. According to the copper-molybdenum membrane etching liquid, the problem of stability decomposition of hydrogen peroxide caused by factors such as PH value, heat and metal ions in the working process of the etching liquid is solved, and the hydrogen peroxide can have favorable stability under the conditions of temperature increase, metal ion content increase and the like, so that the realization of uniform etching is facilitated; during etching, the reaction rate of molybdenum metal is reduced, molybdenum and copper are etched at the same rate, and finally CD LOSS and a slope angle, which meet the process requirements of a customer, can be presented; and the copper-molybdenum membrane etching liquid contains no fluoride ions and is environment-friendly.

Description

technical field [0001] The invention relates to the processing of a liquid crystal panel formed with a copper-based metal film, in particular to the processing of a liquid crystal panel with a copper / molybdenum alloy metal film, and mainly relates to an etching solution for a copper-molybdenum film of a liquid crystal panel. Background technique [0002] At present, in the production process of high-generation liquid crystal panels, the array process requires the use of copper-molybdenum film etching solution, and the etched metal film layer structure is copper / molybdenum alloy. For example, hydrogen peroxide etchant, hydrogen peroxide + fluoride etchant etc. are known. [0003] Publication No. CN103668208A and CN103924242A disclosed Chinese patent copper-molybdenum alloy film or copper / molybdenum film etching solution composition is made up of hydrogen peroxide, hydrogen peroxide stabilizer, fluoride, chelating agent, etch inhibitor, etch additive etc.; During the process,...

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Problems solved by technology

[0003] Publication No. CN103668208A and CN103924242A disclosed Chinese patent copper-molybdenum alloy film or copper / molybdenum film etchant composition by hydrogen peroxide, hydrogen peroxide stabilizer, fluoride, Chelating agent, etching inhibitor, etching additive, etc.; during the etching process, with the continuous precipitation of metal ions, the stability of hydrogen peroxide gradually decreases. When the content of metal ions is about 2000ppm, the heavy metal ions Cu and Fe produced will Promote the catalytic decomposition of H2O2, resulting in uneven etching of the substrate, so that the etching pattern requirements (CD LOSS and slope angle) gradually cannot meet the process requirements; at the same time , Hydrogen peroxide will also decompose, producing oxygen and water, which are wasted before the etching effect occurs. When the gas concentration reaches a certain level, an explosion phenomenon will occur

Moreover, it contains fluoride ions, which can remove molybdenum and titanium residues and reduce the length of the tail. Most of the glass etching inhibitors are fluorides; calculated according to the daily consumption of nearly 20 tons of process etching solution by liquid crystal panel manufacturers, the resulting The amount of fluorine-containing wastewater, including the fluorine-containing cleaning water produced by cleaning, is also quite large, close to 100 tons per day, so the treatment cost of fluoride-containing wastewater is also quite high, and has a great impact on the environment