Method for preparing reflective film on the surface of ultra light reflective mirror
A mirror and reflective film technology, applied in the field of surface engineering, can solve the problems of rough surface, large performance differences of reflective materials, poor matching, etc., to achieve the effect of easy repetition, improved compactness and adhesion, and easy polishing.
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Embodiment 1
[0025] (1) Chemical cleaning: Use pure nitrogen to blow the mirror blank, and use analytical pure anhydrous ethanol to chemically clean the surface of the mirror.
[0026] (2) Vacuum degassing: Fix the mirror blank on the workpiece frame in the vacuum chamber, turn on the front vacuum pump and the high vacuum pump in turn to evacuate the vacuum to a vacuum degree of 1×10 -3 Pa, turn on the heater to heat the vacuum chamber to 100°C, and perform vacuum degassing treatment on the mirror blank;
[0027] (3) Ion beam cleaning: Introduce Ar gas into the vacuum chamber to keep the vacuum at 2×10 -2 Pa; Turn on the bias power supply, adjust the bias voltage to -200V; turn on the ion source at the same time, set the working voltage to 2.0kV, and the ion beam cleaning time to 30min, and perform ion beam cleaning on the mirror;
[0028] (4) Deposit reflective film: open the Cr target, set the working current to 60A, and plate the Cr transition layer for 30 minutes; open the Ni target, ...
Embodiment 2
[0031] (1) Chemical cleaning: Use pure nitrogen to blow the mirror blank, and use analytical pure acetone to chemically clean the surface of the mirror.
[0032] (2) Vacuum degassing: Fix the mirror blank on the workpiece frame in the vacuum chamber, turn on the front-stage vacuum pump and high vacuum pump in turn to evacuate the vacuum to a vacuum degree of 5×10 -3 Pa, turn on the heater to heat the vacuum chamber to 140°C, and perform vacuum degassing treatment on the mirror blank;
[0033] (3) Ion beam cleaning: pass Ar+O into the vacuum chamber 2 gas, maintain a vacuum of 4 x 10 -2 Pa; Turn on the bias power supply, adjust the bias voltage to -100V; turn on the ion source at the same time, set the working voltage to 3.0kV, and the ion beam cleaning time to 20min, and perform ion beam cleaning on the mirror;
[0034] (4) Deposit the reflective film: open the NiCr target, set the working current to 70A, and plate the NiCr transition layer for 20 minutes; open the Ag target...
Embodiment 3
[0037] (1) Chemical cleaning: Use pure nitrogen to blow the mirror blank, and use analytical pure anhydrous ethanol to chemically clean the surface of the mirror.
[0038] (2) Vacuum degassing: Fix the mirror blank on the workpiece frame in the vacuum chamber, turn on the front-stage vacuum pump and high vacuum pump in turn to evacuate the vacuum until the vacuum degree is better than 3×10 -3 Pa, turn on the heater to heat the vacuum chamber to 120°C, and perform vacuum degassing treatment on the mirror blank;
[0039] (3) Ion beam cleaning: Introduce Ar gas into the vacuum chamber to keep the vacuum at 3×10 -2 Pa; Turn on the bias power supply, adjust the bias voltage to -150V; turn on the ion source at the same time, set the working voltage to 2.5kV, and the ion beam cleaning time to 25min, and perform ion beam cleaning on the mirror;
[0040] (4) Deposit reflective film: open the Cr target, set the working current to 50A, and plate the Cr transition layer for 30 minutes; o...
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