Method for controllable growing of two-dimensional chalcogen compound atomic-scale film on metal substrate
A technology of chalcogenides and metal substrates, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problem of poor controllability, difficulty in obtaining high-quality two-dimensional chalcogenide atomic-level thin films on a large scale, Discontinuity etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0023] Example 1
[0024] A method for preparing atomic-grade chalcogenide films by chemical vapor deposition includes the following preparation steps:
[0025] (1) The 20-micron thick molybdenum foil substrate is first annealed at 1400 degrees for more than 10 hours in a hydrogen environment with a flow rate of 50sscm;
[0026] (2) Cut the annealed molybdenum foil into 3.5×2.5cm 2 Put the small pieces of the into the quartz tube furnace;
[0027] (3) Weigh 0.5 g of sulfur powder and put it into the front end of the quartz tube, where it is heated by a heating belt;
[0028] (4) Seal both ends of the quartz tube and vacuum for 20 minutes to remove the remaining oxygen in the pipeline;
[0029] (5) Then connect one end of the quartz tube with the silicone tube and seal it with vacuum pump oil;
[0030] (6) Open the argon cylinder valve and inject argon into the quartz tube to make the flow rate 10sccm;
[0031] (7) Turn on the tube furnace temperature control switch, set the heating rate to...
Example Embodiment
[0038] Example 2
[0039] A method for preparing atomic-grade chalcogenide films by chemical vapor deposition includes the following preparation steps:
[0040] (1) The 20-micron thick molybdenum foil substrate is first annealed at 1400 degrees for more than 10 hours in a hydrogen environment with a flow rate of 50sscm;
[0041] (2) Cut the annealed molybdenum foil into 3.5×2.5cm 2 Put the small pieces of the into the quartz tube furnace;
[0042] (3) Weigh 0.5 g of sulfur powder and put it into the front end of the quartz tube, where it is heated by a heating belt;
[0043] (4) Seal both ends of the quartz tube and vacuum for 20 minutes to remove the remaining oxygen in the pipeline;
[0044] (5) After connecting one end of the quartz tube with the silicone tube, seal it with vacuum pump oil;
[0045] (6) Open the argon cylinder valve and inject argon into the quartz tube to make the flow rate 10sccm;
[0046] (7) Turn on the tube furnace temperature control switch, set the heating rate t...
Example Embodiment
[0053] Example 3
[0054] A method for preparing atomic-grade chalcogenide films by chemical vapor deposition includes the following preparation steps:
[0055] (1) The 20-micron thick molybdenum foil substrate is first annealed at 1400 degrees for more than 10 hours in a hydrogen environment with a flow rate of 50sscm;
[0056] (2) Cut the annealed molybdenum foil into 3.5×2.5cm 2 Put the small pieces of the into the quartz tube furnace;
[0057] (3) Weigh 0.5 g of selenium powder and put it into the front end of the quartz tube, where it is heated by a heating belt;
[0058] (4) Seal both ends of the quartz tube and vacuum for 20 minutes to remove the remaining oxygen in the pipeline;
[0059] (5) Then connect one end of the quartz tube with the silicone tube and seal it with vacuum pump oil;
[0060] (6) Open the hydrogen and argon cylinder valves, and inject hydrogen and argon into the quartz tube to make the flow rate of 2sccm and 18sccm;
[0061] (7) Turn on the tube furnace temperat...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap