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TiO2 nano-beam/boron-doped diamond film composite photoelectrocatalysis electrode and preparation method and application thereof

A technology of boron-doped diamond and photoelectric catalysis, which is applied in the field of preparation of TiO2 nanobeam/boron-doped diamond film composite photocatalytic electrode and composite photocatalytic electrode, which can solve the problem of photocatalytic performance that needs to be improved, high equipment requirements and complicated preparation process and other problems, to achieve the effect of shortening the degradation time, increasing the contact area, and overcoming easy aggregation

Active Publication Date: 2016-03-16
ZHENGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

With no p-n heterojunction structure (imprinted, TiO 2 ) Compared with FTO, the photoelectrocatalytic performance of this electrode is good, but its preparation process is complicated, and the requirements for equipment are high, and TiO 2 Spindle-shaped, scattered distribution, its photocatalytic performance needs to be improved

Method used

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  • TiO2 nano-beam/boron-doped diamond film composite photoelectrocatalysis electrode and preparation method and application thereof
  • TiO2 nano-beam/boron-doped diamond film composite photoelectrocatalysis electrode and preparation method and application thereof
  • TiO2 nano-beam/boron-doped diamond film composite photoelectrocatalysis electrode and preparation method and application thereof

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Experimental program
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Effect test

Embodiment 1

[0028] TiO 2 The nanobeam / boron-doped diamond film composite photoelectrocatalytic electrode, its preparation steps are as follows:

[0029] 1) Take a silicon substrate (silicon wafer, purity 99.999%) and ultrasonically clean it with absolute ethanol, acetone, and ultrapure water for 10 minutes to remove impurities such as oxides on the surface of the substrate; then place the cleaned substrate on The suspension containing diamond powder (mixed powder with a particle size greater than 5nm and less than 250nm) was ultrasonically cleaned for 1 hour to form tiny, dense pits and nucleation defects on the surface of the substrate to reduce the free energy of nucleation; The bottom was ultrasonically cleaned with absolute ethanol and ultrapure water for 10 minutes respectively, and then dried with nitrogen after cleaning;

[0030] 2) Place the above-mentioned silicon substrate (substrate) in a microwave plasma chemical vapor deposition reaction chamber, use diborane as a boron sour...

Embodiment 2

[0035] TiO 2 The nanobeam / boron-doped diamond film composite photoelectrocatalytic electrode, its preparation steps are as follows:

[0036] 1) Take a silicon substrate (silicon wafer, purity 99.999%) and ultrasonically clean it with absolute ethanol, acetone, and ultrapure water for 10 minutes to remove impurities such as oxides on the surface of the substrate; then place the cleaned substrate on The suspension containing diamond powder (mixed powder with a particle size greater than 5nm and less than 250nm) was ultrasonically cleaned for 1 hour to form tiny, dense pits and nucleation defects on the surface of the substrate to reduce the free energy of nucleation; The bottom was ultrasonically cleaned with absolute ethanol and ultrapure water for 10 minutes respectively, and then dried with nitrogen after cleaning;

[0037] 2) Place the above-mentioned silicon substrate (substrate) in a microwave plasma chemical vapor deposition reaction chamber, use diborane as a boron sour...

Embodiment 3

[0040] TiO 2 The nanobeam / boron-doped diamond film composite photoelectrocatalytic electrode, its preparation steps are as follows:

[0041] 1) Take a silicon substrate (silicon wafer, purity 99.999%) and ultrasonically clean it with absolute ethanol, acetone, and ultrapure water for 10 minutes to remove impurities such as oxides on the surface of the substrate; then place the cleaned substrate on The suspension containing diamond powder (mixed powder with a particle size greater than 5nm and less than 250nm) was ultrasonically cleaned for 1 hour to form tiny, dense pits and nucleation defects on the surface of the substrate to reduce the free energy of nucleation; The bottom was ultrasonically cleaned with absolute ethanol and ultrapure water for 10 minutes respectively, and then dried with nitrogen after cleaning;

[0042] 2) Place the above-mentioned silicon substrate (substrate) in a microwave plasma chemical vapor deposition reaction chamber, use diborane as a boron sour...

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Abstract

The invention discloses a TiO2 nano-beam / boron-doped diamond film composite photoelectrocatalysis electrode and a preparation method and application thereof and belongs to the technical field of materials chemistry, environmental electrochemistry and pollutant control. The preparation method of the TiO2 nano-beam / boron-doped diamond film composite photoelectrocatalysis electrode comprises the steps that firstly, a layer of boron-doped diamond film which has the good electrochemical performance is deposited on a silicon substrate through a microwave plasma chemical vapor deposition method; secondly, TiO2 nano-beams which have the photocatalytic performance are grown on the surface of the boron-doped diamond film through a hydrothermal method; and finally, the composite photoelectrocatalysis electrode of a p-n junction structure is formed. Compared with a boron-doped diamond film bare electrode, the TiO2 nano-beams of the composite photoelectrocatalysis electrode are added for modification, so that the p-n junction structure is formed, and accordingly the photoelectric conversion efficiency is improved, and the degrading time of organic dyestuff in waste water is effectively shortened; compared with an electrode modified through a TiO2 nano-film, the electrode has more active sites, the contact area between the electrode and the dyestuff can be increased, and the degrading efficiency is improved.

Description

technical field [0001] The present invention relates to a kind of TiO 2 The nanobeam / boron-doped diamond film composite photoelectric catalysis electrode also relates to the preparation method and application of the composite photoelectric catalysis electrode, and belongs to the technical fields of material chemistry, environmental electrochemistry and pollutant control. Background technique [0002] With the rapid development of printing and dyeing industry, the dye wastewater produced is increasing day by day. The basic raw materials for dye production are benzene series, naphthalene series, anthraquinone, aniline and benzidine compounds, and they are often chelated with metals, salts and other substances during the production process, resulting in mostly salt-containing, Chloride or bromide, slightly acidic or slightly alkaline, metal ion-containing, sulfur-containing high chemical oxygen demand, high chroma, and "three-caused" toxic refractory organic wastewater have a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/04C23C16/511C23C16/27C23C18/12B01J21/06C02F1/30C02F1/46C02F101/30
CPCB01J21/063C02F1/46109C02F2001/46133C02F2001/46142C02F2101/30C23C16/274C23C18/1216C23C28/042
Inventor 王海龙席耀辉张锐李剑胡碧涌卢绪高李得源邵刚范冰冰陈德良许红亮卢红霞
Owner ZHENGZHOU UNIV
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