Industrial organic waste gas catalytic degradation catalyst cooperated with low-temperature plasma, and preparation method and application of catalyst
A low-temperature plasma, catalytic degradation technology, applied in physical/chemical process catalysts, separation methods, metal/metal oxide/metal hydroxide catalysts, etc., to achieve the effects of easy industrial application, low raw materials, and simple preparation
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Embodiment 1
[0043] Catalyst preparation: The catalyst is prepared by impregnation and calcination, using 50% manganese nitrate aqueous solution, cobalt nitrate, cerium nitrate, and foamed silicon carbide as raw materials, according to the loading of manganese oxide, cobalt oxide, and cerium oxide at 1%, 3%, and 1%. The proportion of the solution is prepared, and after being dried by excessive impregnation of silicon carbide, it is placed in a muffle furnace for calcination at a temperature of 450 ° C for 4 hours to obtain a catalyst.
[0044] Application treatment: The catalyst is 1% MnO supported by foamed silicon carbide with a thickness of 20mm and a pore size of 20ppi x 3%CoO x 1% CeO x / SiC catalyst. The initial gas concentration is: [toluene]=100ppm, with air as the carrier gas, and the flow rate is 2L / min. Discharge voltage is 18KV positive high voltage, and reaction temperature is room temperature, and the removal rate of toluene is 98%, O 3 Residual 4ppm, NO x Residual 0ppm....
Embodiment 2
[0046] Catalyst preparation: The catalyst is prepared by impregnation and calcination, using nickel nitrate, cobalt nitrate, lanthanum nitrate, and foamed silicon carbide as raw materials, and the solution is prepared according to the loading ratio of nickel oxide, cobalt oxide, and lanthanum oxide to 2%, 2%, and 1%. , after drying by excessively impregnating silicon carbide, place it in a muffle furnace for calcination at a temperature of 450°C for 4 hours to obtain the catalyst.
[0047] Application treatment: The catalyst is 2% NiO supported by foamed silicon carbide with a thickness of 20mm and a pore size of 20ppi x 2%CoO x 1%LaO x / SiC catalyst. The initial mixed gas concentration is: [toluene]=50ppm, [xylene]=50ppm, with air as the carrier gas, and the flow rate is 2L / min. Discharge voltage is 18KV positive high voltage, and reaction temperature is room temperature, and the removal rate of toluene, xylene is respectively 99%, 97%, O 3 Residual 12ppm, NO x Residual ...
Embodiment 3
[0049] Catalyst preparation: The catalyst is prepared by impregnation and calcination, using copper nitrate, cobalt nitrate, calcium nitrate, and foamed silicon carbide as raw materials, and preparing solutions according to the ratio of copper oxide, cobalt oxide, and calcium oxide loading to 1%, 3%, and 1%. , after drying by excessively impregnating silicon carbide, place it in a muffle furnace for calcination at a temperature of 450°C for 4 hours to obtain the catalyst.
[0050] Application treatment: the catalyst is 1% CuO supported by foamed silicon carbide with a thickness of 20mm and a pore size of 20ppi x 3%CoO x 1% CaO x / SiC catalyst. The initial mixed gas concentration is: [ethyl acetate]=50ppm, [acetone]=50ppm, with air as the carrier gas, and the flow rate is 2L / min. Discharge voltage is 18KV positive high voltage, and reaction temperature is room temperature, and the removal rate of ethyl acetate, acetone is respectively 99%, 96%, O 3 Residual 5ppm, NO x Resi...
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