Full-graphene group flexible organic field-effect transistor and manufacturing method thereof

A manufacturing method and graphene technology, which is applied in semiconductor/solid-state device manufacturing, photovoltaic power generation, electrical components, etc., can solve the problems of high production equipment and process control requirements, difficult control of single crystal thin film growth, and difficulty in achieving product yield, etc. problems, to achieve stable electrical performance, low requirements for production equipment, and strong water and oxygen resistance

Inactive Publication Date: 2016-05-11
CHINA JILIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, the organic semiconductor material with the highest mobility is pentacene. The performance parameters of field effect transistors prepared with this material have reached the level of amorphous silicon. However, the field effect transistors prepared from this material need to be grown by physical vapor deposition under high vacuum. Single crystal thin film is formed, but the growth of single crystal thin film is difficult to control. At the same time, the stability of the device is poor, and it is difficult to meet the production requirements for product yield. Moreover, the physical vapor deposition method requires high vacuum and high temperature, which is harmful to production equipment and High process control requirements and high energy consumption are not conducive to low-cost commercial production; in addition, the current method of preparing flexible electrodes in field effect transistors is to sputter indium tin oxide (ITO) on flexible substrates, but ITO itself is relatively Brittle, it will crack under mechanical stress and excessive bending, so ITO electrodes also restrict the application of device flexibility

Method used

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  • Full-graphene group flexible organic field-effect transistor and manufacturing method thereof
  • Full-graphene group flexible organic field-effect transistor and manufacturing method thereof
  • Full-graphene group flexible organic field-effect transistor and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0048] 1.1 as Figure 6-1 and 6-2 , choose PI with a thickness of 90 μm, scrub the PI with detergent powder and cut it into 2cm×2.5cm, and then ultrasonically clean it with acetone, ethanol, and deionized water for 10 minutes respectively;

[0049] 1.2 After drying with nitrogen, the surface of PI was treated with oxygen plasma to make the surface hydrophilic, and the preparation of 101 and 109 was completed.

Embodiment 2

[0051] 2.1 Weigh 30mg of purified graphene oxide powder with an electronic scale, weigh 60ml of ethanol with a measuring cylinder, and mix the two in a glass bottle;

[0052] 2.2 Seal the above-mentioned glass vial and place it on a magnetic stirrer for 2 hours to prepare a 15 mg / ml solution.

Embodiment 3

[0054] 3.1 as Figure 6-3 and 6-4 As shown, turn on the mechanical pump of the glue homogenizer, and set the parameters of the glue homogenizer: low speed rotation 400 rpm, 4 seconds, high speed rotation 1000 rpm, 50 seconds;

[0055] 3.2 Put 101 and 109 in Example 1 on the tip respectively, press the suction piece, pipette 40 μl of the graphene oxide solution in Example 2 and drop it on 101 and 109, close the lid and start spin coating ;

[0056] 3.3 After the spin coating is finished, put the spin-coated 101 and 109 into a vacuum drying oven, evacuate to 0.09Pa, set the temperature at 70°C, and dry for 2 hours to complete the preparation of 102 and 106. After testing with a step meter The film thickness of 102 and 106 is 20nm;

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Abstract

The invention provides a full-graphene group organic field-effect transistor and a manufacturing method thereof. The electrical properties of the field-effect transistor is improved by using the stability and high migration rate of graphene group materials, and meanwhile, high-quality thin films can be obtained from graphene group semiconductor materials by using a spin coating technology, so that the requirement for equipment in production is reduced; and moreover, electrodes can be formed on dielectric layers directly by using an oxidized graphene femtosecond laser reduction technology, automatic production can be realized through software control, and the full-graphene group organic field-effect transistor is convenient for large-scale preparation and low in production cost. The full-graphene group organic field-effect transistor provided by the invention is of two structures, which are a bottom-gate top contact organic field-effect transistor and a bottom-gate bottom contact organic field-effect transistor, and the difference is that the positions of source electrodes and drain electrodes of the bottom-gate top contact organic field-effect transistor and the bottom-gate bottom contact organic field-effect transistor are different. The full-graphene group organic field-effect transistor can be applied to manufacturing of flexible circuits such as flexible display screens, intelligent wearable equipment and biological sensors, and provides the solution to further application of future organic integrated circuits.

Description

technical field [0001] The invention relates to the field of semiconductor devices, in particular to an all-graphene family flexible organic field effect transistor and a manufacturing method thereof Background technique [0002] As the most basic electronic component in integrated circuits, field effect transistors are necessary components for the manufacture of various integrated circuits, and are widely used in various electronic products, such as computer chips, mobile phones, digital cameras, etc. Its performance also affects the overall performance of the circuit. Taking computer chips as an example, with the development of integrated circuits, the integration level is getting higher and higher. The current mainstream integration level is 64M, that is, the number of electronic components contained on a single chip. The number is 60 million, and the line width of the most advanced integrated circuit in the world has been reduced to 0.13 microns, that is, the minimum cha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/05H01L51/10H01L51/40C01B31/04
CPCH10K10/46H10K10/82H10K77/111Y02E10/549
Inventor 唐莹马力超韦一彭应全王颖
Owner CHINA JILIANG UNIV
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