A manufacturing method of an economical high-precision surface-enhanced Raman active substrate

Abstract

The invention relates to a method for manufacturing an economical high-precision surface-enhanced Raman active substrate, including initial preparation, preparation of a suspension of silica microspheres, preparation of an ordered surface array of a single-layer silica surface activation substrate, and surface enhancement. Raman active substrate preparation, Raman substrate detection and other five steps, the activation and surface amination of silica microspheres are carried out through organic chemical processes, and then the array-ordered silica monolayer surface activation is prepared by a simple self-assembly method substrate, and then splashed on the nano-gold film shell and finally obtained. The invention has good economy, high degree of standardization, relatively poor process route, suitable for industrialized production, enhanced surface Raman, strong amplification ability and identification ability, high reliability and good stability.

Description

technical field [0001] The invention relates to the field of physical and chemical detection, in particular to an economical high-precision surface-enhanced Raman active substrate manufacturing method. Background technique [0002] The preparation of surface-enhanced Raman active substrates based on localized surface plasmon resonance has been prepared by complex methods, such as electron beam etching, ion beam etching or template etching, etc. The substrates prepared by etching technology have high repeatability and pull Mann enhancement effect is remarkable, but the preparation cost is high, the instrument operation is complicated, and the preparation time is too long. Although the discrete localized plasmon structure can also provide strong Raman enhancement, the repeatability needs to be improved. The noble metal-dielectric hierarchical structure is composed of noble metal films, dielectric layers, and noble metal nanostructures, which can display superior Raman enhance...

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Problems solved by technology

[0002] The preparation of surface-enhanced Raman active substrates based on localized surface plasmon resonance has been prepared by complex methods, such as electron beam etching, ion beam etching or template etching, etc. The substrates prepared by etching technology have high repeatability and pull Mann enhancement effect is remarkable, but the preparation cost is high, the instrument operation is complicated, and the preparation time is too long

Although the discrete localized plasmonic structure can also provide strong Raman enhancement, the repeatability needs to be improved.

The noble metal-dielectric hierarchical structure is composed of noble metal films, dielectric layers and noble metal nanostructures, which can show superior Raman enhancement effect, but the cost is too high due to the extensive use of noble metal materials

[0003] Combining the self-assembly method and other technologies, the plasmon-photonic composite structure can be prepared, which can save costs, but the Raman signal of the early noble metal-covered dielectric sphere array needs to be enhanced

In recent years, it has been proposed to adsorb nano-noble metal particles or self-assembled noble metal nanoparticles on dielectric sphere arrays (compared with metal thin films, which can only be enhanced by 3 orders of magnitude), or on the basis of noble metal-covered dielectric sphere arrays. Methods such as self-assembly of noble metal nanoparticles have greatly improved the intensity of Raman signals compared with noble metal thin films, but the above structure still has disadvantages such as high cost, complicated preparation process, and enhancement effect to be strengthened.

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