Formaldehyde sensor based on organic field effect transistor
A formaldehyde sensor and organic field technology, applied in the field of sensors, can solve the problems of pollution, poor flexibility of formaldehyde sensors, high detection limit of formaldehyde sensors, etc., and achieve the effect of solving secondary pollution, excellent water absorption characteristics, and easy industrialized large-scale production
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[0036] The preparation method of the organic semiconductor layer can be one of plasma-enhanced chemical vapor deposition, thermal oxidation, spin coating, vacuum evaporation, drop film, imprinting, printing or air spray; the thickness of the organic semiconductor layer 4 is 50 ~120nm.
[0037] The materials of the gate electrode, the source electrode and the drain electrode are all one or more of graphene, carbon nanotubes, metal elemental nanowires, zinc oxide, titanium oxide, indium tin oxide or polymer electrode materials, and the preparation method It can be one of various deposition methods such as vacuum thermal evaporation, magnetron sputtering, plasma-enhanced chemical vapor deposition, screen printing, printing, and spin coating. The thickness of the gate electrode, the source electrode and the drain electrode are all 50-80 nm.
[0038] The metal elemental nanowires are iron nanowires, copper nanowires, silver nanowires, gold nanowires, aluminum nanowires, nickel nanowire...
Example Embodiment
[0051] Example 1
[0052] The preparation method is as follows:
[0053] ① Thoroughly clean the PI substrate sputtered with 50nm ITO as the gate electrode, and dry it with dry nitrogen after cleaning;
[0054] ②Prepare a PS film on ITO by spin coating to form a gate insulating layer of 100nm;
[0055] ③ Heat and bake the spin-coated PS film;
[0056] ④ Spin-coating 100nm of organic semiconductor layer with a mass ratio of indigo:diatom mud of 97:3 on the gate insulating layer;
[0057] ⑤The copper source electrode and the drain electrode of 80nm are prepared by vacuum evaporation.
[0058] Test the formaldehyde response characteristics of the device, and measure the saturation current I of the device SD = 6μA, carrier mobility μ = 2×10 -3 cm 2 / Vs, threshold voltage V TH =-14V, good response to formaldehyde at room temperature.
Example Embodiment
[0059] Example 2
[0060] The preparation method is as follows:
[0061] ① Thoroughly clean the PEI substrate sprayed with 80nm silver nanowires as the gate electrode, and dry it with dry nitrogen after cleaning;
[0062] ②Prepare PMMA film on silver nanowires by spin coating to form gate insulating layer 520nm;
[0063] ③ Heat and bake the spin-coated PMMA film;
[0064] ④ Spin-coating the indigo blue: diatom mud on the gate insulating layer with an organic semiconductor layer with a mass ratio of 94:6 at 120nm;
[0065] ⑥Prepare 70nm silver source electrode and drain electrode by vacuum evaporation.
[0066] Test the formaldehyde response characteristics of the device, and measure the saturation current I of the device SD =12μA, carrier mobility μ =0.004cm 2 / Vs, threshold voltage V TH =-16V, good response to formaldehyde at room temperature.
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