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A kind of method for preparing nipt alloy target material by centrifugal forming

A technology of centrifugal forming and alloy target, which is applied in metal material coating process, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of reduced purity and high reject rate, and achieve the goal of ensuring product purity and improving product yield Effect

Active Publication Date: 2020-10-30
YUNNAN PRECIOUS METALS LAB CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The NiPt target products used today are all in the shape of thin plates, with a thickness ranging from about 2-8mm according to different needs, and a maximum width of about 600mm. Such a shape cannot be realized by conventional casting methods, but in actual production work Among them, when using conventional rolling or forging processing methods mentioned in the above-mentioned documents to process alloy product ingots within the composition range of (40-90wt.%Pt), the reject rate is as high as 95% or more; at the same time, Since cracks are prone to occur at the grain boundary, and the fresh cracks are also the first place to be oxidized and contaminated by gas impurities, resulting in a sharp increase in the internal defects of the target product and greatly reducing the purity

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] Produce xxx brand NiPt target products, with a thickness of 2.5-3mm, a circular shape with a radian, a diameter of 450mm, and a composition ratio of Ni-60wt.%Pt. Use nickel and platinum with a purity of not less than 99.95% as raw materials for material preparation, use a vacuum intermediate frequency induction furnace, wash the furnace with argon for many times, and then melt under the protection of argon; use a mold with a diameter of 450mm*4mm, assemble according to requirements, and heat before casting To 450-500°C, set the speed at 120-150r / min, wrap the sprue and riser with zirconia cotton, increase the temperature of the melt by about 100°C, and then pour it into the mold at a constant speed until the riser is full. Heat and rotate continuously, wait for half an hour, then stop heating and rotating. After fully cooling, open the furnace and take out the mold. The casting is well filled and the shape is complete. After cutting the riser, it is plane milled to reac...

Embodiment 2

[0018] Produce xx brand NiPt target products, thickness 6.0-6.5mm, square shape, size 400-420mm*120-125mm, composition ratio of Ni-76wt.%Pt. Using the same melting process as in Example 1, using a mold with a diameter of 450mm*7mm, the casting process and mold assembly are the same as in Example 1. The shape of the casting is complete. Take it out and cut it with a riser. Use a shearing machine to cut it to a rough shape and then use face milling and plane milling to reach the final product size. The composition and impurity content analysis, the results meet the requirements, the PTF test is qualified, and the shipment standard is met, and it is qualified once.

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PUM

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Abstract

The invention discloses a method for preparing a NiPt alloy target material by centrifugal shaping and relates to a method for preparing a thin sheet part NiPt alloy target material by a centrifugal shaping casting technology. By means of the method, a destructive effect caused by exerting stress processing on a cast ingot is avoided, production work procedures are simplified, a product material purity is ensured, and a product yield is greatly improved. When a NiPt alloy ingredient proportion is in a 40 to 90wt.%Pt interval, a system can change orderly, and a formed ordered structure can greatly weaken alloy stress processing performance. By means of utilizing a rotary heating platform and a specially designed model for casting, a shape of the cast ingot is nearly same as a shape of a product, a final size can be achieved through follow-up simple machining, and a qualified product can be manufactured. Therefore, the problem of an extremely high rejection rate in utilizing a traditional stress processing method to process a product in the ingredient interval is solved.

Description

technical field [0001] The present invention is a special preparation method proposed for the NiPt alloy target in the 40-90wt.% Pt composition interval, so as to avoid the extremely high rejection rate caused by stress processing, simplify the production process, ensure the purity, and improve the quality of the target and yield. Background technique [0002] At present, after the semiconductor integrated circuit (IC) industry enters the 65nm and 45nm technology nodes, due to the limitation of the line width effect, titanium silicide and cobalt silicide (90nm and above) have been NiPt-silicide prepared by nickel and nickel alloy targets The nickel silicide prepared by the sputtering process using NiPt alloy as the target has wireless broadband benefits and bridging phenomenon, and the sheet resistance and leakage current are small, and low-temperature annealing can make less The advantages of silicon atom migration and small residual stress in the film are applied in the f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34B22D13/04C22C5/04C22C19/03
CPCB22D13/04C22C5/04C22C19/03C23C14/3414
Inventor 毕珺闻明沈月宋修庆熊庆丰
Owner YUNNAN PRECIOUS METALS LAB CO LTD