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Polishing liquid and preparation method thereof

A polishing liquid and nano-diamond technology, applied in the field of sapphire polishing, can solve the problems of high wafer surface roughness, large surface tension and brittleness, and low polishing efficiency, so as to improve polishing efficiency and polishing quality, reduce surface roughness, increase The effect of economic benefits

Inactive Publication Date: 2019-01-22
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the hardness of A-direction sapphire is as high as 9 on the Mohs scale, second only to diamond. Compared with C-direction sapphire, it is more difficult to process, and the compactness of A-direction sapphire makes it have greater surface tension and brittleness, resulting in difficulties in machining and polishing. The problems of low efficiency, high wafer surface roughness, and excessive loss of auxiliary materials limit the development of A to the sapphire industry

Method used

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  • Polishing liquid and preparation method thereof
  • Polishing liquid and preparation method thereof
  • Polishing liquid and preparation method thereof

Examples

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Embodiment 1

[0025] Example 1: A polishing liquid, including the following components in mass percentage: nanodiamond 5%, surfactant 2%, dispersant 2%, friction modifier 0.5%, complexing agent 0.6%, oxidant 0.5%, pH Conditioner 1.0% and 88.4% deionized water.

[0026] The friction modifier is prepared by combining Tween 20, Tween 80 and benzotriazole.

[0027] The particle size of nanodiamond is 200nm, and the shape of nanodiamond particles is spherical or flake.

[0028] The surfactant is prepared by combining sodium dodecylbenzene sulfonate and alkyl alcohol amide.

[0029] The dispersant is prepared by combining polyethylene glycol 600 and nonylphenol polyoxyethylene ether.

[0030] The complexing agent is prepared by any one or a combination of glycine and disodium ethylenediaminetetraacetic acid.

[0031] The oxidant is hydrogen peroxide.

[0032] The pH adjusting agent is potassium hydroxide.

[0033] The preparation method of polishing liquid includes the following steps:

[0034] A. Process nan...

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Abstract

The invention provides polishing liquid and a preparation method thereof. The polishing liquid is prepared from the following components in percentage by mass: 0.2-10% of nano-diamond, 0.1-3% of surfactant, 0.02-5% of dispersant, 0.01-2% of friction regulator, 0.1-1% of complexing agent, 0.01-2% of oxidizer, 0.01-2% of pH regulator and the balance of deionized water. As for an A-direction sapphiresmart watch and a mobile phone cover plate which are polished by the prepared polishing liquid, the apparent yield reaches up to 86.5%, the surface roughness is as low as 0.35 nm, the cutting rate reaches up to 4.3 mu m / h, the polishing efficiency and the polishing quality are effectively improved, and meanwhile economic benefits are also increased.

Description

Technical field [0001] The invention relates to the technical field of sapphire polishing, in particular to a polishing liquid and a preparation method thereof. Background technique [0002] Sapphire, also known as white gem, molecular formula is Al 2 O 3 , Is a multifunctional oxide crystal with a hexagonal crystal structure. It has excellent optical, physical and chemical properties. Compared with natural gemstones, it has the characteristics of high hardness, high melting point, good light transmission, excellent thermal conductivity and electrical insulation, good wear resistance, and stable corrosion resistance. Therefore, it is widely used in optoelectronics, communications, and national defense. And other fields. [0003] CMP (Chemical Mechanical Polishing, chemical mechanical polishing) technology is almost the only technology that can achieve global planarization, which combines the advantages of chemistry, machinery, and fluid mechanics. The application of CMP technolog...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 周群飞李强
Owner LENS TECH CHANGSHA