Two-dimensional strontium niobate nanosheet ultraviolet phototransistor detector
A technology of nanosheets and strontium niobate, which is applied to semiconductor devices, circuits, electrical components, etc., can solve the problems of slow response speed and large dark current, and achieve the effect of fast response speed and high photoelectric gain
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Embodiment 1
[0027] Embodiment 1, a kind of two-dimensional strontium niobate nanosheet ultraviolet phototransistor detector, such as figure 1 shown, including SiO 2 / Si substrate 1, 2, spin-coated strontium niobate Sr dispersed on the substrate 2 Nb 3 o 10 Nano sheet 3, a chromium-gold electrode 4 in contact with the upper surface of the nano sheet.
Embodiment 2
[0028] The preparation steps of the two-dimensional strontium niobate nanosheet ultraviolet phototransistor detector in this embodiment are as follows:
[0029] (1) Preparation of strontium niobate nanosheets, using high-temperature solid-state reaction-ion exchange-liquid phase exfoliation method: 99.9% pure solid Cs 2 CO 3 , SrCO 3 and Nb 2 o 5 The powder is mixed and ground for 1 hour according to the molar ratio of 1:1.8:2.5, and sintered at a high temperature of 1200°C for 6 hours, and the product is cooled with the furnace. The obtained product was mixed with 1 mol / L hydrochloric acid, ion-exchanged for 5 days, and then the product was washed several times with ultrapure water and dried. A certain amount of the obtained product was weighed, mixed with an equimolar ratio tetrabutylammonium hydroxide (TBAOH) solution, shaken at room temperature for 10 days with a multi-purpose oscillator, and centrifuged to obtain the stripped strontium niobate nanosheets. The product...
Embodiment 2
[0031] Example 2, using the ultraviolet phototransistor detector prepared by the present invention to detect incident light in a specific ultraviolet band:
[0032] Utilize the ultraviolet phototransistor detector shown in embodiment 1, device source, drain are connected with semiconductor testing system respectively, change voltage, record the electric current that flows through device under dark state and illumination condition, as image 3 shown. Under the same voltage, the device exhibited a higher current when irradiated with 270nm ultraviolet light.
[0033] Using the ultraviolet phototransistor detector shown in Example 1, connect the source and drain of the device to the semiconductor test system respectively, keep the bias voltage constant, change the wavelength of the incident ultraviolet light, record the current flowing through the device, and calculate the response rate ,Such as Figure 4 shown. The device exhibits good detection performance near the ultraviole...
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Abstract
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