Lithium-aluminum silicon-series glass material allowing photolithography, and preparation method and application thereof

A glass material, lithium aluminum silicon technology, applied in glass manufacturing equipment, glass molding, manufacturing tools, etc., can solve the problems of large dielectric constant, glass strength drop, easy to break, etc., to achieve simple and clear material composition, improve The effect of surface quality and convenient production process

Active Publication Date: 2020-03-31
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Schott has disclosed a Foturan photolithographic glass with a composition ratio of SiO 2 75~85wt%, Li 2 O 7~11wt%, K 2 O and Al 2 o 3 3~6wt%, Na 2 O 1~2wt%, ZnO2 o 3 0.2~0.4wt%, Ce 2 o 3 0.01~0.04wt%, Ag 2 O 0.05~0.15wt%, the photoetching glass is difficult to meet the application in the field of electronic devices due to its large dielectric constant and large dielectric loss.
The University of Electronic Science and Technology of China has disclosed a photoetching glass whose composition ratio is SiO 2 63~72wt%, Li 2 O 6~12wt%, Na 2 O 1~5wt%, K 2 O 3~9wt%, Al 2 o 3 2~5wt%, ZnO 1~4wt%, Sb 2 o 3 0.5~0.9wt%, Ce 2 o 3 0.02~0.0

Method used

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  • Lithium-aluminum silicon-series glass material allowing photolithography, and preparation method and application thereof
  • Lithium-aluminum silicon-series glass material allowing photolithography, and preparation method and application thereof
  • Lithium-aluminum silicon-series glass material allowing photolithography, and preparation method and application thereof

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preparation example Construction

[0036] The preparation method of the photolithographic lithium-aluminum-silicon glass material of the above-mentioned embodiment 1-embodiment 5 comprises the following steps:

[0037] 1) Mix high-purity quartz sand, lithium carbonate, anhydrous potassium carbonate, aluminum hydroxide, anhydrous sodium carbonate, zinc oxide, antimony trioxide, cerium nitrate hexahydrate, and silver nitrate according to the formula in Table 1, respectively , to get the batch material;

[0038] 2) Put the batch material obtained in step 1) into the mixer to fully grind and mix, and sieve through 40 mesh; put it in a high-temperature melting furnace, melt it at 1520°C for 1 hour, and stir it at a speed of 15r / min for 1 hour hour, then stirred at a speed of 30r / min for 2 hours, then stirred at a speed of 15r / min for 1 hour (to make clarification and homogenization better), so that the batch material was completely melted into a liquid state for clarification and homogenization;

[0039] 3) After t...

Embodiment 3

[0045] The Al content of embodiment 3 is identical with embodiment 1, but because Li + The higher the content, the stronger the ion polarization in the glass, the higher the dielectric constant, the weaker the mixed alkali effect, and the higher the dielectric loss.

Embodiment 6

[0047] This embodiment provides a method for preparing a photolithographic lithium-aluminum-silicon-based glass material. The difference between this preparation method and the preparation method in the above-mentioned embodiment 1 is that the melting temperature in step 2) of this embodiment is 1500° C. . The specific components of the prepared lithium-aluminum-silicon glass material are the same as those in Example 1.

[0048] Photolithographic glass can also be obtained by lowering the melting temperature, but there are occasional unmelted materials in the formed glass block. It has been verified that the glass obtained by this process still has photosensitive properties, but in the subsequent processing process, it must be avoided. Impurities such as unmelted material.

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Abstract

The invention relates to lithium-aluminum silicon-series glass material allowing photolithography, and a preparation method and an application thereof. The lithium-aluminum silicon-series glass material includes, by weight, 72-76% of SiO2, 10-15% of Li2O, 3-4% of K2O, 6-8% of Al2O3, 2-3% of Na2O, 1-1.2% of ZnO, 0.8-1.5% of Sb2O3, 0.04-0.08% of Ce2O3, and 0.04-0.08% of Ag2O. The silicon-series glass material has simple and definite material composition and simple production process, and has the equal photosensitiveness as the similar glass products.

Description

technical field [0001] The invention belongs to the field of glass materials, and in particular relates to a photolithographic lithium-aluminum-silicon glass material and a preparation method and application thereof. Background technique [0002] Photolithographic lithium aluminum silicon glass is a functional glass material compatible with microelectronics technology. After ultraviolet lithography and wet etching processes, specific microstructures can be prepared on its surface or inside, and are widely used in communication, aerospace, biomedicine and other fields. [0003] The processability of photolithographic Li-Al-Si glass comes from the trace amount of photosensitizer (Ce 2 o 3 ), nucleating agent (Ag 2 O) and a weak reducing agent (Sb 2 o 3 ). Among them, the photosensitive cerium ions are represented by Ce 3+ and Ce 4+ The form exists in the glass network, while the weak reducing agent Sb 2 o 3 maintain Ce 3+ relative content. Under the irradiation of ...

Claims

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Application Information

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IPC IPC(8): C03C3/095C03C6/04C03B19/02C03C15/00
CPCC03C3/095C03C1/00C03B19/02C03C15/00
Inventor 韩勖朱永昌于雷崔竹关铭刘峻
Owner CHINA BUILDING MATERIALS ACAD
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