A preparation process of anti-friction and wear-resistant gear parts
A technology for preparation process and parts, which is applied in the field of preparation process of anti-friction and wear-resistant gear parts, can solve the problems of mechanically matching PVD coating with high hardness and low hardness, unsatisfactory performance of coating, and inability to obtain PVD coating, etc., to achieve improvement Effects of surface treatment efficiency, good support matrix, and mitigation of differences in physical properties
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Embodiment 1
[0029] In the preparation method of wear-resistant gear parts of the present invention, the base material of the gear parts is 22CrNi2MoNbH; The VCrWSiC / Cr multi-layer composite coating on the surface was deposited by the controlled sputtering composite method. During the deposition, 2 C ion plating targets, 1 V magnetron sputtering target, 1 Cr magnetron sputtering target, and 1 W magnetron sputtering target were used. Sputtering target and 1 Si magnetron sputtering target;
[0030] Specifically include the following steps:
[0031](1) Parts processing: parts base blank → quenching (835 ~ 885 ° C, water cooling) → high temperature tempering (525 ~ 565 ° C, water cooling) → roughing → semi-finishing → stress relief tempering (505 ~ 565 ° C, air cooling) )→finishing (surface roughness Ra1.6μm, processing size: lower tolerance limit);
[0032] (2) Parts surface pretreatment: use metal cleaning agent to remove oil stains on the surface of the workpiece, rinse and dry;
[0033]...
Embodiment 2
[0044] In the preparation method of wear-resistant gear parts according to the present invention, the base material of the gear parts is 20MnB, the base of the gear parts is subjected to quenching, high temperature tempering, rough finishing and then carburizing by ion plating, and then ion plating and magnetic The VCrWSiC / Cr multi-layer composite coating on the surface was deposited by the controlled sputtering composite method. During the deposition, 2 C ion plating targets, 1 V magnetron sputtering target, 1 Cr magnetron sputtering target, and 1 W magnetron sputtering target were used. Sputtering target and 1 Si magnetron sputtering target;
[0045] Specifically include the following steps:
[0046] (1) Parts processing: parts base blank → quenching (900 ~ 945 ° C, oil quenching) → high temperature tempering (525 ~ 600 ° C, air cooling) → rough machining → semi-finishing → stress relief tempering (555 ~ 595 ° C, Oil cooling)→finishing (surface roughness Ra1.6μm, processing...
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