Method and device for synchronously compounding and manufacturing diamond micro-grating based on micro-additive and micro-subtractive

A technology of diamond micropowder and diamond, which is applied in the direction of manufacturing tools, laser welding equipment, metal processing equipment, etc., can solve the problems such as the decrease of the surface quality of diamond microstructure, the change of stress state of surrounding materials, and the stress concentration at the edge of microstructure, so as to promote the application and industrialization, improving the aspect ratio, and the effect of high quality and high aspect ratio

Active Publication Date: 2020-10-30
TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for high aspect ratio CVD diamond microstructure processing, there are still some shortcomings in ultrafast laser etching.
When ultrafast laser processing diamond materials, the high temperature near the focal spot often causes the phase transformation of the diamond material at the edge of the fine structure to form amorphous carbon and graphite phases. At the same time, the carbon phase removed by high-temperature gasification will recondense on the surface of the diamond material to form an amorphous carbon phase. , thereby reducing the surface quality of the diamond; in addition, the instantaneous removal of materials near the focal spot will lead to a sharp change in the stress state of the surrounding materials, which will cause stress concentration at the edge of the microstructure, cracks and collapse, resulting in a decrease in the surface quality of the diamond microstructure

Method used

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  • Method and device for synchronously compounding and manufacturing diamond micro-grating based on micro-additive and micro-subtractive
  • Method and device for synchronously compounding and manufacturing diamond micro-grating based on micro-additive and micro-subtractive
  • Method and device for synchronously compounding and manufacturing diamond micro-grating based on micro-additive and micro-subtractive

Examples

Experimental program
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Effect test

example 1

[0045] The surface of the diamond film sample was pretreated, and the diamond film sample was immersed in a suspension prepared by diamond powder and glycerin at a mass ratio of 1:1 and ultrasonically ground for 5 minutes, wherein the particle size of the diamond powder was 5 μm, and then immersed in an anhydrous Ultrasonic cleaning in ethanol for 5 min, and then drying.

[0046] The pretreated diamond film samples were placed in figure 1 Among the devices shown, low-temperature hot-wire CVD diamond deposition is carried out on the surface of the diamond film sample. The process parameters used are: hydrogen flow rate 800ml / min, methane flow rate 50ml / min, hydrogen sulfide flow rate 0.1ml / min, reaction pressure 10Torr , the filament temperature is 2100-2200°C, the substrate temperature is 250°C; the bias current is 4.0A, and the deposition time is 50 hours.

[0047] While the low-temperature hot wire CVD diamond is deposited, laser etching and patterning micromachining are ca...

example 2

[0049] The surface of the diamond film sample was pretreated, and the diamond film sample was immersed in a suspension prepared by diamond powder and glycerin at a mass ratio of 1:1 and ultrasonically ground for 5 minutes, wherein the particle size of the diamond powder was 5 μm, and then immersed in an anhydrous Ultrasonic cleaning in ethanol for 5 min, and then drying.

[0050] The pretreated diamond film samples were placed in figure 1 Among the devices shown, low-temperature hot-wire CVD diamond deposition is carried out on the surface of the diamond film sample. The process parameters used are: hydrogen flow rate 1000ml / min, methane flow rate 100ml / min, hydrogen sulfide flow rate 0.4ml / min, reaction pressure 15Torr , the filament temperature is 2100-2200°C, the substrate temperature is 100°C; the bias current is 1.0A, and the deposition time is 80 hours.

[0051] While the low-temperature hot wire CVD diamond is deposited, laser etching and patterning micromachining are ...

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Abstract

The invention discloses a method and device for synchronously compounding and manufacturing a diamond micro-grating based on micro-additive and micro-subtractive. The method comprises the steps of pretreating the surface of a diamond film sample to remove surface impurities, performing low-temperature hot wire CVD diamond deposition on the surface of the diamond film sample, and performing graphicmicro-machining on the surface of a CVD diamond film to obtain the diamond micro-grating. The device is provided with a low-temperature hot wire CVD diamond deposition system for performing low-temperature hot wire CVD diamond deposition and a laser etching system for performing graphic micro-machining, wherein the low-temperature hot wire CVD diamond deposition system is provided with a vacuum reaction chamber with an optical window formed in the upper end; a workbench is arranged in the vacuum reaction chamber; a gas supply system is arranged outside the vacuum reaction chamber; and a heating wire adding system for exciting reaction gas and heating the diamond film sample is arranged on the workbench. According to the method and device for synchronously compounding and manufacturing thediamond micro-grating based on the micro-additive and the micro-subtractive, spatio-temporal synchronous compounding of micro-additive machining and micro-subtractive machining is achieved, and continuous in-situ growth of a diamond in a non-etching area is achieved.

Description

technical field [0001] The invention relates to a compound manufacturing method of slightly increasing and decreasing materials. In particular, it relates to a method and device for synchronous composite manufacturing of diamond micro-gratings based on micro-addition and subtraction. Background technique [0002] With its excellent broadband and transient properties, terahertz electromagnetic waves can achieve extremely high data transmission rates and stability during wireless communication, thus becoming a key technology for future 6G communication research and development. With the continuous deepening of research on terahertz science and technology at home and abroad, the development of related terahertz devices has put forward higher requirements for materials. CVD diamond materials have broad application prospects in the field of terahertz devices due to their good thermal conductivity, low dielectric constant, low microwave loss, excellent mechanical properties, and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/56C23C16/02B23K26/362
CPCC23C16/271C23C16/56C23C16/0254B23K26/362
Inventor 崔雨潇戚厚军
Owner TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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