Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photopolymer composition, episulfide/epoxy writing monomer, and grating

A technology of photopolymer and writing monomer, applied in the field of optical materials, can solve the problems of reducing the solubility of materials, poor stability of iodine, affecting the optical properties of polymers, etc.

Active Publication Date: 2021-02-02
LIGHTIN INC
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the molar dispersion of the aromatic ring is large, and excessive introduction will affect the optical performance of the polymer when used as an optical material; at the same time, the introduction of aromatic rings, bromine atoms and heavy metal elements will also reduce the solubility of the material; and the stability of iodine is not good. Good, the introduction of iodine will reduce the light and thermal stability of the material

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photopolymer composition, episulfide/epoxy writing monomer, and grating
  • Photopolymer composition, episulfide/epoxy writing monomer, and grating
  • Photopolymer composition, episulfide/epoxy writing monomer, and grating

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0088]The present invention also provides a method for preparing a grating, including: S1) mixing the above-mentioned photopolymer composition to obtain a hybrid; S2) forming a film on the hybrid and forming a grating structure to obtain a grating.

[0089]The above-mentioned photopolymer composition is mixed to obtain a mixture. In some specific embodiments of the present invention, a mixture in the form of a melt or a liquid is obtained by mixing the photopolymer composition.

[0090]In the present invention, the composition can be mixed in a suitable container in proportions, and when necessary, mechanical stirring or other methods can be used to make the mixing uniform. There is no particular restriction on the mixing temperature. Generally, the mixing can be carried out under ambient conditions at room temperature or under heating (preheating).

[0091]In some other specific embodiments, the mixing step may be performed under appropriate heating conditions. The heating temperature can b...

Embodiment 1

[0106]Add compound 1 (Z and Z'are both S), 9,9-bis(methyl acrylate) fluorene, solvent butyl acetate, film-forming agent cellulose acetate butyrate, and initiator N-benzene into the sample bottle Glycine and 2-(4-chlorophenyl)-4,5-diphenylimidazole, after stirring at room temperature until completely clear, add the dye Eosin Y in the dark or under red light and stir for 30min to obtain uniform and clear light Polymer solution (the ratio of all ingredients is shown in the table below). Then coat the mixed solution on a 1mm thick glass substrate under dark or red light, with a coating thickness of about 20μm, and let it stand horizontally until the dye is completely volatilized and cover the surface with a 40μm thick TAC protective film to obtain photopolymerization Material dry board. The final dry board is infigure 2 The energy density used in the double beam optical path shown is 15mJ / cm2532nm laser interference exposure, irradiated by a green LED lamp for about 30 minutes, fixed an...

Embodiment 2

[0111]Add compound 2 (Z is S), compound 3 (Z and Z'are both S), solvent butyl acetate, film forming agent cellulose acetate butyrate, initiator N-phenylglycine and 2-( 4-Chlorophenyl)-4,5-diphenylimidazole, after stirring at room temperature until completely clear, add the dye Eosin Y under dark or red light and stir for 30min to obtain a uniform and clear photopolymer solution (all components The ratio is shown in the table below). Subsequently, the mixed solution was coated on a 1mm thick glass substrate under dark or red light, with a coating thickness of about 20μm. After the dye was completely volatilized, it was placed horizontally and covered with a TAC protective film with a thickness of 40μm. Polymer dry board. The final dry board is infigure 2 The energy density used in the double beam optical path shown is 15mJ / cm2532nm laser interference exposure, irradiated by a green LED lamp for about 30 minutes, fixed and bleached to form a reflective holographic grating.

[0112] co...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an episulfide / epoxy writing monomer. The episulfide / epoxy writing monomer is shown as a formula (I) in the specification; wherein X is an alkane group, a thioether-containing group, an ether bond-containing group, an aromatic hydrocarbon group, a cycloalkane group or a heterocyclic group formed by lacking a+a' H; Y and Y' are each independently one of or a group formed by connection of two or more of alkylene, arylene, S and O through a single bond; n and n' are each independently an integer from 0 to 2; Z and Z' are each independently S or O; and at least one of X, Y, Y', Z and Z' contains S. Compared with the prior art, the refractive index of the monomer is effectively improved by introducing the sulfur element, and the refractive index difference between the monomer and a film-forming agent is further improved, so that the photopolymer material with high refractive index modulation degree is obtained.

Description

Technical field[0001]The invention belongs to the technical field of optical materials, and particularly relates to a photopolymer composition, episulfide / epoxy writing monomer and grating.Background technique[0002]The holographic recording material is a type of material that can record all the information (including amplitude and phase) of the object light wave in the form of interference fringes by using the principle of optical interference. In a typical processing method, the photopolymer composition is irradiated with visible light laser to form elements, and the monomers in the photopolymer composition used for holographic recording are polymerized to form (cured) polymers. As a result, It is possible to produce structural features capable of forming interference patterns in elements formed from the photopolymer composition. At the same time, by modulating the refractive index, a phase hologram with high diffraction efficiency can be formed. Photosensitive / photopolymer materia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07D303/34C07D303/27C07D417/14C07D409/14C07D331/02C07D409/12G03F7/004G03F7/027G02B5/18
CPCC07D303/34C07D303/27C07D417/14C07D409/14C07D331/02C07D409/12G03F7/004G03F7/027G02B5/18
Inventor 陈淑丹魏一振张卓鹏
Owner LIGHTIN INC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com