PCBN cutter with nano diamond film coating on surface and preparation method of PCBN cutter
A nano-diamond and thin-film technology, which is applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of coarse grain size of micro-diamond film, affecting the service life of coating tools, and affecting the quality of diamond film. Achieve the effect of industrial application, good film coating quality and smooth surface
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Embodiment 1
[0056] This embodiment provides a method for preparing a tool with a nano-diamond film coating on the surface, the process flow diagram of the preparation method is as follows figure 1 shown.
[0057] The preparation method comprises the following steps:
[0058] (1) Clean the PCBN tool ultrasonically with acetone for 10 minutes, then dry it at 50°C for 4 minutes, then dry-polish it in diamond powder with a particle size of 100nm for 15 minutes until it is bright, and then place it on a pedestal with a height of 40mm. Put it into the MPCVD system and evacuate to the ultimate vacuum, and then pass H 2 ;
[0059] (2) Turn on the MPCVD system, set the microwave power to 600W, the air pressure in the working chamber to 10Torr, and excite H 2 Generate a plasma ball, and then pass CH 4 begins to deposit, the CH 4 and H 2 The gas flow ratio is 1:50, the microwave power is adjusted to 1500W during the deposition process, the air pressure of the working chamber is 40Torr, the tem...
Embodiment 2
[0067] The present embodiment provides a method for preparing a PCBN cutter with a nano-diamond film coating on the surface, the preparation method comprising the following steps:
[0068] (1) Clean the PCBN tool ultrasonically with acetone for 8 minutes, then dry it at 45°C for 5 minutes, then dry-polish it in diamond powder with a particle size of 10nm for 20 minutes until it is bright, and then place it on a pedestal with a height of 55mm. Put it into the MPCVD system and evacuate to the ultimate vacuum, and then pass H 2 ;
[0069] (2) Turn on the MPCVD system, set the microwave power to 500W, the air pressure in the working chamber to 8Torr, and excite H 2 Generate a plasma ball, then pass CH 4 begins to deposit, the CH 4 and H 2 The gas flow ratio is 4:25, the microwave power is adjusted to 1000W during the deposition process, the air pressure of the working chamber is 20Torr, the temperature of the abutment is 600°C, and the deposition is 12h. After the deposition i...
Embodiment 3
[0071] The present embodiment provides a method for preparing a PCBN cutter with a nano-diamond film coating on the surface, the preparation method comprising the following steps:
[0072] (1) The PCBN tool was ultrasonically cleaned with acetone for 12 minutes, then dried at 45°C for 4 minutes, then dry-polished in diamond powder with a particle size of 500nm for 18 minutes until bright, and then placed on a pedestal with a height of 45mm. Put it into the MPCVD system and evacuate to the ultimate vacuum, and then pass H 2 ;
[0073] (2) Turn on the MPCVD system, set the microwave power to 700W, the air pressure in the working chamber to 12Torr, and excite H 2 Generate a plasma ball, then pass CH 4 begins to deposit, the CH 4 and H 2 The gas flow ratio is 1:100, the microwave power is adjusted to 2000W during the deposition process, the pressure of the working chamber is 60Torr, the temperature of the abutment is 900°C, and the deposition is 6h. After the deposition is com...
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