Mask-free patterned film as well as preparation method and application thereof

A patterned thin film, no mask technology, applied in metal material coating process, vacuum evaporation coating, coating, etc. Problems such as low utilization rate, to achieve the effect of small distance, short coating distance and high utilization rate

Active Publication Date: 2022-04-12
UNIV OF JINAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These coating equipment are relatively expensive, and the distance between the coating source and the substrate to be coated is mostly relatively large, and the utilization rate of the evaporation source is relatively low; and the electroplating method will generate a large amount of waste liquid that pollutes the environment, and further environmental protection treatment is required
Therefore, the cost of traditional coating methods is relatively high
In addition, traditional coating and lithography processes are limited by size, especially lithography equipment, generally the maximum substrate size that can be accommodated is 6-8 inches, and it is also very difficult to operate for substrates smaller than 1cm. Therefore, the substrate of the patterned film using the traditional method will have size limitations
In addition, the preparation of patterned films by traditional methods requires relatively high flatness of the substrate.

Method used

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  • Mask-free patterned film as well as preparation method and application thereof
  • Mask-free patterned film as well as preparation method and application thereof
  • Mask-free patterned film as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0097] Such as figure 1 with figure 2 As shown, a method for preparing a patterned film by laser direct writing on a small-sized substrate comprises the following steps:

[0098] 1) Clean the substrate to be plated. The substrate to be plated is a quartz plate. The substrate to be plated is sequentially immersed in acetone, ethanol, and DI water for ultrasonic cleaning for 5 minutes, and then rinsed with DI water. After cleaning, the substrate is dried.

[0099] 2) Fix the substrate to be plated and the coating material. The coating material is a copper sheet; the substrate to be plated is placed on the bottom, and the coating material is placed on the top and fixed with a fixture.

[0100] 3) Pattern design and parameter setting. Copper sheets are processed by laser scanning set by software installed on a computer. Set a square pattern with a size of 2×2cm on the software, and process it with a laser with a scanning speed of 10mm / s and a power of 1.8W.

[0101] 4) Lase...

Embodiment 2

[0103] Such as image 3 As shown, a method suitable for preparing a patterned film by laser direct writing on a large-scale substrate differs from Example 1 in that:

[0104] Step 1) Clean the substrate to be plated. The substrate to be plated is glass. Rinse the substrate to be plated directly with a DI water gun. After cleaning, dry the substrate to be plated with a nitrogen gun.

[0105] Step 2) The substrate to be plated and the coating material are fixed. The coating material is copper foil; the substrate to be plated is placed below, and the coating material is bonded to the substrate to be plated.

[0106] Step 4) Scanning and irradiating the fixed substrate to be coated and the coating material by using a laser light source. The diameter of the laser spot is set to 10 microns, and the laser scanning interval is 1 mm. The laser bombards the coating material, and the copper clusters produced by the bombardment sputter the substrate to be plated to form an equidistant c...

Embodiment 3

[0108] Such as Figure 4 As shown, the difference between this embodiment and embodiment 1 is:

[0109] Step 4) Laser direct writing. Set the laser program to triangle, pentagon and English letter "UJN", and write the coating material copper foil directly onto the substrate quartz to be coated, such as Figure 4 SEM patterns of different patterns.

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Abstract

The invention discloses a maskless patterned film as well as a preparation method and application thereof. According to the method, laser direct writing is adopted, the substrate to be plated is located above the coating material or below the coating material, and laser is focused on the coating material to prepare the maskless patterned film. When the substrate to be coated is glass and the coating material is a metal material with bacteriostatic ability, the patterned coating can be used as transparent conductive bactericidal glass and is applied to the field of sterilization. When a substrate to be plated is glass and a coating material is a metal material, the prepared patterned coating can form an isothermal amplification micro-fluidic chip with a PDMS substrate with a micro-channel, and the microfluidic chip is applied to microfluidic detection in many fields such as analytical chemistry, life health, medical research and environmental detection. The method does not use a mask plate, is simple and practical, is low in cost, can simply realize patterned coating of substrates of various sizes and materials, and is extremely wide in application range.

Description

technical field [0001] The invention relates to the technical field of patterned thin film material preparation, in particular to a patterned thin film without a mask plate and its preparation method and application. Background technique [0002] Patterned thin films are widely used in traditional semiconductor optoelectronic device / electronic device manufacturing process, thin film battery manufacturing process, sensor device manufacturing process, emerging constant temperature amplification microfluidic chip and other biomedical material preparation process, and even in daily life. The patterned film preparation process is used in the pattern preparation process of handicrafts. [0003] In the existing technology, there are generally two methods for preparing a patterned film on a substrate: one is to prepare a film on the substrate first, and then prepare a mask, and make a film pattern by corrosion, etching, etc.; the other is to The pattern is first prepared on the sub...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/28C23C14/04
CPCC23C14/28C23C14/048
Inventor 刘晓燕周伟家张婷刘震刘宏
Owner UNIV OF JINAN
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