Preparation method of piezoelectric coating with adjustable surface morphology and piezoelectric coating
A technology of surface morphology and coating, applied in coating, metal material coating process, vacuum evaporation coating and other directions, can solve the problem that the working temperature can only reach 150-200 ℃, the working temperature is limited below 400 ℃, Increase sensitivity and other issues to achieve good piezoelectric sensing performance, easy preparation and regulation, and reduce demand.
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preparation example Construction
[0054] figure 2 A schematic structural diagram of a radio frequency magnetron sputtering PVD equipment, the present invention provides a method for preparing a piezoelectric coating with adjustable surface morphology, comprising the following steps:
[0055] (1) Design and prepare sputtering target: Sputtering target 2 is made of LiNbO 3 , LiNb 3 O 8 Two-Phase Lithium Niobate Oxide and Li 2 O powder is uniformly mixed and pressed, LiNbO 3 : LiNb 3 O 8 : Li 2 O=1:1:1. The sputtering target 2 is a target that provides material for the piezoelectric coating, and has a diameter of about 15 cm and a thickness of 0.8 cm. The sputtering target is the basis for the control of the coating morphology. Li 2 O is a necessary condition for obtaining lithium ions. Lithium ions are light in weight and easy to move on the surface of the coating, which in turn drives the formation of surface corrugated structures; LiNb 3 O 8 It is used to improve and compensate the stoichiometric c...
example 1
[0074] The invention provides a method for preparing a piezoelectric coating with adjustable surface topography. The prepared special surface topography can be adjusted. 2 Ratio, Ar / O 2 Surfaces with different morphologies can be obtained by mixing the airflow rate, the distance between the substrate and the sputtering target, etc.
[0075] combine image 3 , to verify the effect of substrate placement on coating morphology and to confirm high temperature stability performance.
[0076] (1) Design and prepare a hybrid sputtering target: the sputtering target 2 is made of LiNbO 3 , LiNb 3 O 8 Two-Phase Lithium Niobate Oxide and Li 2 O powder is uniformly mixed and pressed, LiNbO 3 : LiNb 3 O 8 : Li 2 O=1:1:1, the target diameter is about 15cm and the thickness is 0.8cm;
[0077] (2) Preliminary cleaning of the substrate: prepare three single-crystal silicon wafers of 3 cm × 5 cm as the experimental substrate 1, ultrasonically clean in acetone for 15 minutes to remove ...
Embodiment 2
[0086] combine Figure 4 , on the basis of comparison with Example 1, further verification of Ar / O 2Effect of flow ratio on coating morphology.
[0087] (1) Design and prepare a hybrid sputtering target: as in Example 1;
[0088] (2) Preliminary cleaning of the substrate: prepare a single crystal silicon wafer of 3cm×5cm as the experimental substrate 1, ultrasonically clean it in acetone for 15 minutes to remove the surface adhesive and stubborn contaminants; then ultrasonically clean it with alcohol for 10 minutes , remove the acetone residue on the surface of the substrate; then ultrasonically clean with deionized water for 5 minutes to remove the alcohol residue; finally, dry it in a nitrogen atmosphere and quickly put it into a vacuum chamber.
[0089] (3) Preliminary experimental environment: the single crystal silicon wafer is placed at the edge area 6E of the sample holder, and the others are as in Example 1;
[0090] (4) Ion beam deep cleaning substrate: as in Examp...
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