Preparation process of metal aluminium template for assembling nano-micron array material

Abstract

The invention discloses a form preparing method for assembling nanometer-micrometre array material, which is characterized by the following: pre-processing 70%(100)high-purity aluminium foil; putting high-purity aluminium foil into acid solution with chloride ion to etch (aluminum foil for anode, ampere density applied by aluminum foil: 0. 1í‡104-7. 0í‡107A/m2, chloride ion solution strength of etching liquor: 0. 5molíñL-1-6. 0molíñL-1, acid concentration: 0. 1molíñL-1-5. 0molíñL-1, etching temperature: 60-02 deg. c, etching time: 2-200s); washing aluminum foil with plenty of clear water; scouring off etching liquor on the surface; drying the aluminum foil after washing; getting aluminium tunnel pore mold with bore diameter of 100nm-2000nm.

Description

1. Technical Field [0001] The invention relates to a method for preparing a metal template for assembling nano-micro array materials. 2. Background technology [0002] The methods currently used to make nanomaterials, such as grinding, sol-gel method, precipitation method, hydrolysis method, etc., are suitable for nanopowder research, and their development time is long and the technology is relatively mature, which is the basis for preparing other nanomaterials. But a major weakness of these technologies is that it is difficult to effectively control the structure of the materials produced. The synthetic nanostructure system can design, assemble, and develop a new material system with special functions that does not exist in nature according to people's wishes, so that the various exotic properties and functions of nanomaterials can be more fully utilized and utilized. [0003] The template method to synthesize nanostructure units (including zero-dimensional nanoparticles, quasi-...

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Problems solved by technology

[0008] Unfortunately, the above method takes a long time to prepare the aluminum oxide film. Usually, it takes about 6 hours for the first oxidation and 12 hours for the second oxidation. It also takes a long time to gradually reduce the voltage to thin the barrier layer and the phosphoric acid through hole.

And because the aluminum oxide film is very thin and brittle, the film peeled off from the aluminum foil substrate is easy to crack, curl and deform, and the mechanical strength is very poor. It is still quite difficult to prepare a large-area aluminum oxide porous template.

[0009] Chinese patent CN1609283A discloses a method for preparing an ordered porous anodized aluminum template. This method requires electrochemical polishing, primary oxidation, removal of oxide film, secondary oxidation, and stripping of the aluminum base on the aluminum sheet, which takes a long time. , about 7h-13 hours, this kind of alumina template is difficult to get rid of the disadvantage of poor toughness of alumina

[0010] Chinese patent CN1614740A discloses a method for preparing a large-area, highly ordered nano-silicon quantum dot array. This method uses an alumina template. The preparation of the alumina template is obtained by two corrosions of high-purity aluminum. The first corrosion uses The electrochemical method takes 2 hours, and then soaks in a mixture of phosphoric acid and chromic acid for 4 hours. The second corrosion is the same as the first corrosion condition, and it takes 2.5min-5.0min. In addition, it takes 30min to remove the upper barrier layer. Although the method takes less time than the general two-time oxidation of alumina templates, it still takes several hours, and this alumina template is still difficult to get rid of the disadvantage of poor toughness

But this method first requires a larger area of ​​AAO template as the motherboard

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