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Anti strong light and strong heat radiative composite coating and preparation method thereof

A composite coating and thermal radiation technology, which is applied in the coating, metal material coating process, sputtering plating, etc., can solve high temperature, complex problems, etc., and achieve the effects of improving performance, easy access, and increasing transmittance

Inactive Publication Date: 2009-02-11
BEIJING SHANGCHAO NEW ENERGY TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the method of sputtering (sequentially sputtering silicon oxide, silicon nitride, vanadium oxide) and then annealing, the process requires high temperature and is relatively complicated. In addition, since silicon wafers are used as substrates instead of glass substrates
This process of making thin films is not suitable for ordinary glass, ceramic or metal substrates

Method used

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  • Anti strong light and strong heat radiative composite coating and preparation method thereof
  • Anti strong light and strong heat radiative composite coating and preparation method thereof
  • Anti strong light and strong heat radiative composite coating and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0031] The preparation method of the vanadium dioxide thin film whose phase transition temperature is 68 DEG C comprises the following steps in sequence:

[0032] (1) The glass substrate is cleaned by ultrasonic waves to remove impurities such as organic pollutants, dust and metal ions on the surface of the substrate, and the vanadium dioxide film is deposited on the glass substrate by radio frequency magnetron sputtering, using a metal vanadium target , the background vacuum is 9×10 -4 pa, the heating temperature is 500-600°C, argon and oxygen are introduced, the total pressure of the sputtering gas is 1Pa, the sputtering power is 100W-150W, the sputtering time is 30-120 minutes, and the film thickness is about 100-200nm. The above-mentioned vanadium dioxide film can also be prepared by other methods, such as pulsed laser deposition and sol-gel method.

[0033] (2) Deposit a layer of nickel phthalocyanine thin film on the above-mentioned W-doped vanadium dioxide thin film by...

Embodiment 2

[0036] The preparation method of the vanadium dioxide thin film whose phase transition temperature is 35 DEG C comprises the following steps in sequence:

[0037] (1) The glass substrate is cleaned by ultrasonic waves to remove impurities such as organic pollutants, dust and metal ions on the surface of the substrate, and the vanadium dioxide film is deposited on the glass substrate by radio frequency magnetron sputtering, using a metal vanadium target , place the tungsten wire symmetrically on the vanadium target, sputter the vanadium target and the tungsten wire at the same time, the background vacuum is 9×10 -4 Pa, the heating temperature is 500-600°C, the argon and oxygen are fed, the total sputtering gas pressure is 1Pa, the sputtering power is 120W, the sputtering time is 30-120 minutes, and the film thickness is about 100-200nm.

[0038] (2) Deposit a layer of nickel phthalocyanine thin film on the above-mentioned W-doped vanadium dioxide thin film by spin coating metho...

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Abstract

The invention provides a compound coating for preventing strong light and strong thermal radiation, the coating sequentially comprises: an infrared intelligent layer which is arranged on a glass, ceramic or metal matrix and a light amplitude limiting layer which is covered outside the infrared intelligent layer; the thickness of the infrared intelligent layer is 50 to 500nm; and the thickness of the light amplitude limiting layer is 100 to 1000nm. The invention further provides a method for preparing the compound coating layer for preventing the strong light and the strong thermal radiation on the glass, ceramic or metal matrix, the method firstly adopts the radio frequency magnetron sputtering technology to form the infrared intelligent layer on the glass, ceramic or metal matrix by sputtering; then the method adopts the Spin-coating method or the vacuum evaporation method to form the light amplitude limiting layer on the infrared intelligent layer. The compound coating increases the light amplitude limiting layer on the infrared intelligent layer, thereby improving the performance of the existing VO2 thin film, being conductive to the environmental protection and being capable of preventing the strong light and the strong thermal radiation.

Description

technical field [0001] The invention relates to the field of composite coating materials, in particular to a composite coating for preventing strong light and strong heat radiation and a preparation method thereof. Background technique [0002] Vanadium dioxide (VO 2 ) will have a semiconductor / metal phase transition at about 68°C, and the phase transition is reversible. Before and after the phase transition, VO 2 The optical and electrical properties change dramatically. The infrared transmittance decreases from 70% or more of the semiconductor phase to less than 10% or lower of the metal phase, and the change of the resistivity can reach 3 to 5 orders of magnitude. Thanks to VO 2 The phase transition temperature of all materials is the closest to room temperature, and it is easy to reduce the phase transition temperature to a comfortable level only by doping a small amount of high-valence metals, such as tungsten (W) and molybdenum (Mo). room temperature range. Theref...

Claims

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Application Information

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IPC IPC(8): C03C17/34C04B41/89C23C28/00C23C14/34C23C14/54C23C14/18B05D7/24
Inventor 冯克安王学进孔繁泽
Owner BEIJING SHANGCHAO NEW ENERGY TECH
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