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Method for preparing nano-mesh film

A nano-network and thin-film technology, applied in the direction of nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problems of not obtaining a network structure, etc., and achieve high monodispersity and long-range order, good mechanical strength and flexibility sexual effect

Inactive Publication Date: 2009-09-23
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, since the deposition process usually starts with a substrate loaded with a single-layer colloidal crystal mask, most of the arrays obtained by deposition are arrays of bowl-shaped structures instead of distinct network structures.

Method used

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  • Method for preparing nano-mesh film
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Examples

Experimental program
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Effect test

Embodiment 1

[0015] The nanonet film provided by the invention is prepared according to the following steps.

[0016] 1) Polystyrene (PS) colloidal particle emulsion (solvent is water) with a diameter of 500nm synthesized by a soap-free emulsion polymerization method with a volume fraction of 10%, diluted with ethanol at a volume ratio of 1:1, and ultrasonically mixed and dispersed Uniformly, the colloidal sphere dispersion liquid is obtained for later use.

[0017] 2) Use a mixture of concentrated sulfuric acid and hydrogen peroxide (volume ratio 7:3) to treat a glass piece (1cm×1cm) at 100°C for 2 hours, and then place the hydrophilized glass piece in a petri dish with a diameter of 6cm In the center, add water around the glass slide until it is nearly but not submerged.

[0018] 3) Add 10 μL of the colloidal sphere dispersion onto the glass slide with a micropipette. Under the action of surface tension, the colloidal sphere dispersion will automatically spread around and form a colored...

Embodiment 2

[0025] The double-layer nano-net film provided by the present invention is prepared according to the following steps.

[0026] 1) The nanomesh prepared according to Example 1 is fished out from the floating liquid surface with any substrate to obtain a solid substrate (such as a Si substrate) loaded with a single-layer nanomesh.

[0027] 2) After the above-mentioned substrate loaded with a single-layer nanonet film is dried, insert the substrate again under the liquid surface floating with a single-layer nanonet film, and pull it out to obtain a substrate loaded with a double-layer nanonet film , corresponding to figure 2 as shown in b.

Embodiment 3

[0029] According to the following steps, the nanonet provided by the present invention is prepared as a patterned mask in nanofabrication.

[0030]Using a single-layer nano-net film or a double-layer nano-net film as a mask, thermal evaporation is used to deposit other substances on the substrate, and the nano-net mask is removed with tape to obtain a regular patterned nanoparticle array on the substrate. For example, using a single-layer nanonet as a mask, a regular array of disc-shaped gold nanoparticles arranged in a hexagonal arrangement can be obtained according to the existing conventional thermal evaporation deposition method; using a double-layer nanonet with different stacked phases as a mask, Depositing gold by thermal evaporation can obtain leaf-shaped gold nanoparticles, and its arrangement and size are different according to the double-layer nanomesh mask of different superimposed phases, such as a gold nano-blade array arranged in a square, a gold nano-particle ar...

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Abstract

The invention discloses a method for preparing a nano-mesh film, comprising the following steps: monolayer colloidal crystal which floats at the surface of reaction solution is taken as a masking film; reaction gas is injected on the surface of the reaction solution; the reaction gas reacts with the reaction solution on an gas-solution interface; a reaction product is deposited on the liquid surface which is not covered by the colloidal crystal; after the colloidal crystal is removed, a nano-mesh film is obtained. The invention has simple operation, high production and cheap reagents, does not need any special apparatus, can be realized by chemical reaction at room temperature, and is generally used for preparing various inorganic nano-meshes. The nano-mesh film has high regularity and large area, convenient movement, easy assembly to multilayer nano-mesh, and the like, and has potential using value in the fields such as nanoprocessing, optical device, sensing, sieving, etc.

Description

technical field [0001] The invention relates to a method for preparing a nano-net film. Background technique [0002] Thin films of semiconductors, metals or dielectrics with periodic and regular nanopores can scatter electromagnetic waves at the submicron scale, so they often exhibit some peculiar optical and electrical properties; nanonets with regular structures can be used as nanofabrication Patterned masks in process; nano / micro meshes with monodisperse mesh and high porosity are valuable for high performance nano / microfiltration. [0003] At present, the traditional methods for preparing nanonets mainly include etching technology using focused ion beam etching, PDMS (polydimethylsiloxane) stamp pattern or electron beam lithography pattern as a mask, laser coherent holographic printing technology and The anodic porous aluminum oxide film is used for chemical deposition reaction, but it is difficult for these production methods to have the advantages of simplicity, high...

Claims

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Application Information

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IPC IPC(8): B82B3/00B82B1/00
Inventor 齐利民李澄洪国松
Owner PEKING UNIV
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