A kind of solar heat conversion absorbing film system and preparation method thereof
An absorbing film and heat conversion technology, applied in solar thermal devices, solar thermal power generation, chemical instruments and methods, etc., can solve difficult problems and achieve the effects of low equipment requirements, simple and easy preparation methods, and easy-to-obtain raw materials
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0026] best practice
[0027] 1. Add 21.0 g of citric acid and 29.1 g of nickel nitrate hexahydrate into 50 mL of water in turn under stirring, and continue stirring until a clear 2.0 mol / L Ni sol is obtained.
[0028] 2. Add 21.0g of citric acid and 37.5g of aluminum nitrate nonahydrate to 50mL of water in turn under stirring, and continue stirring until a clear 2.0mol / L Al 2 o 3 Sol.
[0029] 3. Mix 15.3g tetraethyl orthosilicate and 50mL containing 0.001wt% HNO at room temperature3 Mix the aqueous solution, and add 0.1 wt% silicone modified polyoxyethylene ether surfactant and 0.1 wt% fatty alcohol polyoxyethylene ether AEO-9, and keep stirring until a homogeneous and clear 1.6mol / L SiO 2 Sol.
[0030] 4. Combine Ni sol and Al 2 o 3 The sol was mixed according to Ni:Al molar ratio = 80:20 and 1 wt% fatty alcohol polyoxyethylene ether AEO-9 was added. After stirring evenly, a Ni-Al with a nickel content of 80% and suitable wetting properties was obtained. 2 o 3 Mix t...
Embodiment 2
[0037] 1. Add 21.0g of citric acid and 29.1g of nickel nitrate hexahydrate into 50mL of water. After stirring and refluxing the temperature to 90°C, add 24.8g of ethylene glycol until a clear 2.0mol / L Ni sol is obtained. .
[0038] 2. Add 21.0g of citric acid and 37.5g of aluminum nitrate hexahydrate into 50mL of water. After stirring and refluxing the temperature to 90°C, add 24.8g of ethylene glycol until a clear 2.0mol / L Al 2 o 3 Sol.
[0039] 3. At room temperature, mix 15.3g tetraethyl orthosilicate and 50mL containing 0.005wt% HNO 3 Mix the aqueous solution, and add 0.1 wt% silicone-modified polyoxyethylene ether surfactant and 0.1 wt% phenolic polyoxyethylene ether TX-100, and keep stirring until a homogeneous and clear 1.6mol / L SiO 2 Sol.
[0040] 4. Combine Ni sol and Al 2 o 3 The sol was mixed according to the molar ratio of Ni:Al=90:10 and 0.5 wt% of phenolic polyoxyethylene ether TX-100 was added. After stirring evenly, a Ni-Al with a nickel content of 90% a...
Embodiment 3
[0047] 1. Add 21.9g of ethylenediaminetetraacetic acid and 14.6g of nickel nitrate hexahydrate to 50mL of water in turn under stirring, then add ammonia water to it until the pH of the solution is about 10, and obtain a clear 1.0mol / L Ni sol.
[0048] 2. Add 21.9g of ethylenediaminetetraacetic acid and 18.8g of aluminum nitrate hexahydrate to 50mL of water in turn under stirring, then add ammonia water to it until the pH of the solution is about 10, and obtain a clear 1.0mol / L Al 2 o 3 Sol.
[0049] 3. At room temperature, mix 7.6g tetraethyl orthosilicate and 50mL containing 0.001wt% HNO 3 Mix the aqueous solution, and add 0.1 wt% silicone modified polyoxyethylene ether surfactant and 0.1 wt% fatty alcohol polyoxyethylene ether AEO-6, and keep stirring until a homogeneous and clear 0.8mol / L SiO 2 Sol.
[0050] 4. Combine Ni sol and Al 2 o 3 The sol was mixed according to the molar ratio of Ni:Al=70:30 and 0.5 wt% fatty alcohol polyoxyethylene ether AEO-6 was added. Afte...
PUM
Property | Measurement | Unit |
---|---|---|
solar absorptance | aaaaa | aaaaa |
emissivity | aaaaa | aaaaa |
emissivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com