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Method and apparatus for removing contaminants from nitrogen trifluoride

A nitrogen trifluoride, pollutant technology, applied in nitrogen trifluoride, chemical instruments and methods, separation methods, etc.

Inactive Publication Date: 2014-02-19
AIR PROD & CHEM INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The boiling points of nitrogen trifluoride and carbon tetrafluoride are very similar, respectively -129°C and -128°C, with a difference of only 1°C, and their molecular size and polarity are also similar. Difficulty removing carbon tetrafluoride from nitrogen trifluoride

Method used

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  • Method and apparatus for removing contaminants from nitrogen trifluoride
  • Method and apparatus for removing contaminants from nitrogen trifluoride
  • Method and apparatus for removing contaminants from nitrogen trifluoride

Examples

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Embodiment 1

[0062] Use a wave number of 1275cm -1 The light radiation contains CF 4 NF of impurities 3 gas. The light source is multiple quantum cascade lasers (QCL), e.g. focused to provide greater than 10J / cm 2 The QCL of the fluence was from Alpes Lasers (Neuchatel, Switzerland). Contains CF 4 NF of impurities 3 The gas will be contained in a gas container such as a White cell (long-range gas cell) with a volume of approximately 2 L manufactured by CIC Photonics (Albuquerque, NM). The window of the container is transparent to infrared light, for example a window made of potassium bromide (KBr). Using a mass flow controller will contain CF 4 NF of impurities 3 Process gas is provided into the vessel, and the pressure in the vessel is maintained at 500 Pa using a vacuum pump (eg, manufactured by Edwards) and a pressure control valve (eg, manufactured by MKS, Andover, MA). The procedure is to evacuate the gas container to a pressure below 5Pa, and then isolate the gas container f...

Embodiment 2

[0064] NF by irradiating the process gas under nearly collision-free conditions using techniques including trapped ion cyclotron resonance (ICR) spectroscopy 3 CF contained in the process gas 4 Impurities are dissociated. Quantum cascade lasers (QCL), such as those from Alpes Lasers (Neuchatel, Switzerland), can be used for the radiation. The light source has a 1275cm -1 wavenumber and 10w cm -2 Strength of. The output of the quantum cascade laser (QCL) will be focused transversely to the magnetic field through the 92% transparent mesh to irradiate ions in the source region of the ICR cell. A collimated 6 mm diameter infrared beam is reflected by a polished mirror on the base plate back through the source region. Electron beam pulse application (10 ms duration) to generate ionic species, which is then present for several seconds during which CF 4 Impurities dissociate. Contains CF 4 Neutral NF 3 The pressure of the process gas is 133×10 -7 to 133×10 -6 Pa, the neutr...

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PUM

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Abstract

A highly pure nitrogen trifluoride process fluid having an impurity content of 10 ppm or less can be effectively obtained by using radiation to cause the dissociation of chemical bonds in the impurity to form dissociation products and thereby make the removal of the dissociation products from the process fluid easier than the removal of the impurity from the process fluid.

Description

[0001] related earlier application [0002] This application is a non-provisional application of Serial No. 61 / 662,698 filed June 21, 2012, which is hereby incorporated in its entirety. Background technique [0003] The present invention relates to an efficient method for the removal of contaminants from fluid streams containing nitrogen trifluoride and one or more undesirable components, known as impurities or contaminants, by typical commercially available Known separation methods are not easy to separate from this stream, a typical pollutant can be a small amount of carbon tetrafluoride. [0004] Nitrogen trifluoride (NF 3 ) is widely used in the steps of cleaning CVD (chemical vapor deposition) devices or etching semiconductors in the electronic component manufacturing industry, and it is generally used by fluorine (F 2 ) and ammonia (NH 3 ) and / or ammonium salts or by direct electrolysis of ammonium fluoride. Because carbon electrodes are used in some electrolysis pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B21/083
CPCC01B21/0837G01N21/031B01D53/007C01P2002/82Y02C20/10C01P2006/80G01N21/05B01D53/02B01D53/68C01B21/083
Inventor A·D·约翰逊J·G·兰甘
Owner AIR PROD & CHEM INC
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