Bi0.90Ho0.10Fe1-XMnXO3 ferroelectric film with high remanent polarization and preparation method thereof
A ferroelectric thin film, polarization technology, applied in chemical instruments and methods, inorganic chemistry, iron compounds, etc., can solve the practical application obstacles of BiFeO3 materials, it is difficult to obtain a saturated hysteresis loop, and it is difficult to prepare pure equal problem, to achieve the effect of improving multiferroic properties, enhancing insulation and improving electrical properties
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Embodiment 1
[0038] Step 1: Select the FTO / glass substrate as the substrate, place the cut FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning, rinse the substrate with a large amount of distilled water after each ultrasonic cleaning for 10 minutes, and finally use nitrogen blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, then take it out and let it stand at room temperature. Finally, place the FTO / glass substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness".
[0039] Step 2: Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 9H 2 O, Ho (NO 3 ) 3 ·6H 2 O and C 4 h 6 MnO 4 4H 2 O is dissolved in the mixed solution, and a uniform and stable precursor solution is obtained after magnetic stirring for 2.5 hours, wherein the mixed solution is formed by mixing ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3:1, and the total in the precursor solution ...
Embodiment 2
[0044] Step 1: Select the FTO / glass substrate as the substrate, place the cut FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning, rinse the substrate with a large amount of distilled water after each ultrasonic cleaning for 10 minutes, and finally use nitrogen blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, then take it out and let it stand at room temperature. Finally, place the FTO / glass substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness".
[0045] Step 2: Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 9H 2 O, Ho (NO 3 ) 3 ·6H 2 O and C 4 h 6 MnO 4 4H 2 O is dissolved in the mixed solution, and a uniform and stable precursor solution is obtained after magnetic stirring for 2.5 hours, wherein the mixed solution is formed by mixing ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3:1, and the total in the precursor solution ...
Embodiment 3
[0050] Step 1: Select the FTO / glass substrate as the substrate, place the cut FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning, rinse the substrate with a large amount of distilled water after each ultrasonic cleaning for 10 minutes, and finally use nitrogen blow dry. Then put the FTO / glass substrate into a 70°C oven and bake for 5 minutes, then take it out and let it stand at room temperature. Finally, place the FTO / glass substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness".
[0051] Step 2: Bi(NO 3 ) 3 ·5H 2 O, Fe(NO 3 ) 3 9H 2 O, Ho (NO 3 ) 3 ·6H 2 O and C 4 h 6 MnO 4 4H 2 O is dissolved in the mixed solution, and a uniform and stable precursor solution is obtained after magnetic stirring for 2.5 hours, wherein the mixed solution is formed by mixing ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3:1, and the total in the precursor solution ...
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