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Preparation method of antireflection film applicable to different bases

A technology of anti-reflection film and substrate, which is applied in the direction of solid-state chemical plating, metal material coating process, coating, etc., can solve the problems of increasing the difficulty and cost of anti-reflection film preparation, achieve low raw material cost, easy implementation, Ease of scale-up production

Inactive Publication Date: 2014-04-30
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This increases the difficulty and cost of the preparation of the anti-reflection coating.

Method used

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  • Preparation method of antireflection film applicable to different bases
  • Preparation method of antireflection film applicable to different bases

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Preparation of anti-reflection coating on the surface of ordinary ultra-clear glass

[0022] Tetraethyl orthosilicate (TEOS), ammonia (NH 3 ·H 2 O) and absolute ethanol (EtOH) in a molar ratio of 1:3:50 were mixed and stirred evenly, and placed in a stable environment (20°C, 30% relative humidity) for aging for 7 to 10 days. During the preparation process, in order to control the hydrolysis reaction rate, the ammonia water was dissolved in an appropriate amount of ethanol and then slowly added dropwise to the mixture of TEOS and ethanol. After the sol is aged to light blue latex, reflux at 80 °C until the catalyst ammonia in the sol is removed, and the desired granular silica sol can be obtained.

[0023] Tetraethyl orthosilicate (TEOS), deionized water (H 2 O), hydrochloric acid (HCl) and absolute ethanol (EtOH) according to the molar ratio of 1: 2: 0.2: 40, mixed and stirred evenly, placed in a stable environment (20 ° C, relative humidity 30%) for 7 days to obtain...

Embodiment 2

[0028] Preparation of anti-reflection coating on gallium arsenide substrate surface

[0029] Butyl titanate (Ti(OC 4 h 9 ) 4 , TBOT), absolute ethanol (EtOH), deionized water (H 2 O), glacial acetic acid (HAc), and acetylacetone (AcAc) in a molar ratio of 1:8:3:1.5:0.2 were fully stirred for 2 hours in an environment with a temperature of about 20 °C and a relative humidity of less than 60%, and then aged for 5 - Obtain transparent titanium oxide sol in 7 days. During the preparation process, first dissolve TBOT in half of EtOH, add HAc dropwise while stirring, and the obtained solution is called A solution; then H 2 O is mixed with the other half of EtOH, and the resulting solution is called B solution; finally, B solution is slowly added dropwise to A solution and stirred evenly.

[0030]The preparation process of the three-dimensional chain network structure silica sol is as described in Example 1.

[0031] Slowly add the silica sol with a three-dimensional chain netw...

Embodiment 3

[0034] Preparation of anti-reflection coating on zinc selenide crystal surface

[0035] Aluminum sec-butoxide (Al(C 4 h 9 O) 3 ), deionized water (H 2 O), nitric acid (HNO 3 ) and absolute ethanol (EtOH) according to the molar ratio of 1: 0.6: 0.1: 30, mixed and stirred evenly, placed in a stable environment (20 ° C, relative humidity 30%) and aged for 5 to 7 days to obtain alumina sol . During the preparation process, in order to control the hydrolysis reaction rate, the deionized water and nitric acid were dissolved in an appropriate amount of ethanol before being slowly added dropwise to the mixed solution of aluminum sec-butoxide and ethanol.

[0036] Butyl zirconate (Zr(OC 4 h 9 ) 4 , TBOZ), absolute ethanol (EtOH), deionized water (H 2 O), glacial acetic acid (HAc), and acetylacetone (AcAc) according to the molar ratio of 1:10:3:2:0.1 were fully stirred at room temperature for 2 hours, and then aged for 5-7 days to obtain a transparent zirconia sol. Pay attenti...

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Abstract

The invention relates to a preparation method of an antireflection film applicable to different bases, and provides an antireflection film material matched with the refractive indexes of the bases. The refractive index of the film is mainly obtained in a manner of compounding sols with different micro-structures or the sols with different materials. The sols are selected from one or combination of two of titanium oxide, hafnium oxide, zirconia, alumina, silicon oxide and the like. The method has the advantages that a large-area and irregular shape substrate can be coated, large-scale production is facilitated, the cost is low, and the like.

Description

technical field [0001] The invention belongs to the field of preparation of optical thin films by chemical methods and technical applications, and in particular relates to a preparation method of anti-reflection films for different substrates. Background technique [0002] When light is incident from one medium to another, it is reflected due to the difference in refractive index. The greater the difference in refractive index, the greater the reflectivity. In many practical applications, such as high-power lasers, optical imaging systems, solar energy utilization devices, and semiconductor detectors, it is urgent to reduce unnecessary reflections on the surface of components. By depositing a low-refractive-index film on the base material, the anti-reflection effect with the minimum reflectivity at a specific wavelength can be obtained by using the interference-destructive principle of the film. The anti-reflection effect is determined by the refractive index and thickness ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C20/08
Inventor 王晓栋沈军吴广明周斌
Owner TONGJI UNIV
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