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Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof

A metal base, phosphate light technology, used in electrodes, chemical instruments and methods, electrolysis components, etc., to achieve the effects of enhanced stability, simple operation, and enhanced performance

Inactive Publication Date: 2015-04-08
BEIJING UNIV OF CHEM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the study of photoelectrode modification, there is no report on obtaining chromium-containing compounds to modify photoelectrodes and improving their performance with chromium plating waste solution.

Method used

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  • Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof
  • Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A. Take by weighing nickel nitrate hexahydrate 0.6543g, potassium chromate 0.1456g, potassium nitrate 3.033g is dissolved in 100mL deionized water and is mixed with mixed salt solution;

[0027] B. Transfer the mixed salt solution from step A to a single-chamber electrolytic cell, where the working electrode has an area of ​​1 cm 2 TiO 2 The substrate, the counter electrode is a platinum wire electrode, the reference electrode is an Ag / AgCl electrode, connected to an electrochemical workstation, and a potential of -0.4V is applied to the working electrode for electrodeposition for 50 seconds;

[0028] TiO 2 The substrate synthesis steps are: use acetone: isopropanol: water = 1:1:1 volume ratio solution to ultrasonically clean the FTO conductive glass sheet, and dry it naturally; prepare 6mL hydrochloric acid solution with concentrated hydrochloric acid and water at a volume ratio of 1:1 , add 100μL tetra-n-butyl titanate and stir evenly, transfer the solution to a 20m...

Embodiment 2

[0036] A. Take by weighing nickel nitrate hexahydrate 0.8724g, potassium chromate 0.1942g, potassium nitrate 4.044g is dissolved in 100mL deionized water and is mixed with mixed salt solution;

[0037] B. Transfer the mixed salt solution of step A to a single-chamber electrolytic cell, wherein the working electrode has an area of ​​1.5 cm 2 TiO 2 The substrate, the counter electrode is a platinum wire electrode, the reference electrode is an Ag / AgCl electrode, connected to the electrochemical workstation, and a potential of -0.4V is applied to the working electrode for electrodeposition, and the deposition is 50 seconds, in which TiO 2 The preparation steps of the substrate are the same as in Example 1;

[0038] C. Take out the working electrode after the end, fully wash it with deionized water, and dry it in a 70°C oven for 0.5 hours to obtain a new semiconductor substrate / chromium-containing double metal hydroxide photoelectrode;

[0039] D. with the newly made photoelectr...

Embodiment 3

[0044] A. Take by weighing zinc nitrate hexahydrate 0.6694g, potassium chromate 0.1092g, potassium nitrate 2.4264g be dissolved in 100mL deionized water and be mixed with mixed salt solution;

[0045] B. Transfer the mixed salt solution of step A to a single-chamber electrolytic cell, wherein the working electrode has an area of ​​1.8 cm 2 TiO 2 The substrate, the counter electrode is a platinum wire electrode, the reference electrode is an Ag / AgCl electrode, connected to the electrochemical workstation, and a potential of -0.4V is applied to the working electrode for electrodeposition, and the deposition is 50 seconds, in which TiO 2 The preparation steps of the substrate are the same as in Example 1;

[0046] C. Take out the working electrode after the end, wash it fully with deionized water, and dry it in an oven at 70°C for 1 hour to obtain a new semiconductor substrate / chromium-containing double metal hydroxide photoelectrode;

[0047] D. with the newly made photoelectr...

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Abstract

The invention provides a semiconductor substrate / chromium-containing bimetallic alkaline phosphate photoelectrode and a preparation method thereof. According to the invention, transition metal salt and potassium nitrate are added in chrome plating waste liquid to prepare an electrolyte, then is transferred into an electrolytic bath, the semiconductor substrate is taken as a work electrode, enables electro-deposition under room temperature, under negative potential, nitrate in a solution is reduced on the work electrode to generate hydroxyl, metal ions in the solution is reacted to hydroxyl, and then deposited on semiconductor surface, and the semiconductor substrate is performed with photoelectric chemical treatment in a phosphate buffer solution to obtain the semiconductor substrate / bimetallic alkaline phosphate photoelectrode. According to the invention, operation is sample, reaction condition is mild, chromium plating waste liquid is taken as a reaction raw material, and the method is suitable for high-efficiency recovery and high value utilization of metallic element in the chromium plating waste liquid. The semiconductor substrate / chromium-containing bimetallic alkaline phosphate photoelectrode can be directly used for a photo-electro-chemical catalysis reaction, and reaction performance is obviously increased.

Description

technical field [0001] The invention belongs to the field of metal resource recovery and high-value utilization, and specifically relates to the utilization of chromium and nickel resources in chromium plating waste liquid, and the preparation of a chromium-containing hydroxide-modified photoelectrode, which is used for water splitting driven by sunlight. Background technique [0002] Among the chromium in different valence states, hexavalent chromium is the most harmful, and its toxicity is about 100 times that of trivalent chromium. It can affect the oxidation and reduction of cells, and can combine with nucleic acids. Human body has carcinogenic effect [Zhu Jianhua. The toxicity of chromium in different valence states and its impact on human body. Environment and Development, 1997, 12(3):46-48.]. Chromium-containing wastewater in industrial production is considered to be an important source of serious harm to the environment. The concentration of chromium in untreated ele...

Claims

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Application Information

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IPC IPC(8): C25B11/04C02F1/461
CPCY02W10/33Y02W10/37
Inventor 项顼段雪何宛虹
Owner BEIJING UNIV OF CHEM TECH
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