Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof

A metal base, phosphate light technology, used in electrodes, chemical instruments and methods, electrolysis components, etc., to achieve the effects of enhanced stability, simple operation, and enhanced performance

Inactive Publication Date: 2015-04-08
BEIJING UNIV OF CHEM TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the study of photoelectrode modification, there is no report on obtaining chromium-containing

Method used

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  • Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof
  • Semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and preparation method thereof

Examples

Experimental program
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Example Embodiment

[0025] Example 1

[0026] A. Weigh 0.6543g of nickel nitrate hexahydrate, 0.1456g of potassium chromate, and 3.033g of potassium nitrate, dissolved in 100mL of deionized water to prepare a mixed salt solution;

[0027] B. Transfer the mixed salt solution of step A to a single-chamber electrolytic cell, where the working electrode has an area of ​​1 cm 2 TiO 2 On the substrate, the counter electrode is a platinum wire electrode, and the reference electrode is an Ag / AgCl electrode, connected to an electrochemical workstation, and the working electrode is applied with a potential of -0.4V for electrodeposition for 50 seconds;

[0028] TiO 2 The substrate synthesis steps are as follows: ultrasonically clean the FTO conductive glass sheet with a 1:1:1 volume ratio solution of acetone:isopropanol:water, and dry it naturally; prepare 6mL hydrochloric acid solution with concentrated hydrochloric acid and water at a volume ratio of 1:1 , Add 100μL of tetra-n-butyl titanate and stir evenly, tr...

Example Embodiment

[0035] Example 2

[0036] A. Weigh 0.8724g of nickel nitrate hexahydrate, 0.1942g of potassium chromate, and 4.044g of potassium nitrate dissolved in 100mL of deionized water to prepare a mixed salt solution;

[0037] B. Transfer the mixed salt solution of step A to a single-chamber electrolytic cell, where the working electrode has an area of ​​1.5 cm 2 TiO 2 The substrate, the counter electrode is a platinum wire electrode, the reference electrode is an Ag / AgCl electrode, connected to an electrochemical workstation, and the working electrode is applied with a potential of -0.4V for electrodeposition for 50 seconds, in which TiO 2 The preparation steps of the substrate are the same as in Example 1;

[0038] C. Take out the working electrode after the end, wash it thoroughly with deionized water, and dry it in an oven at 70°C for 0.5 hours to obtain a new semiconductor substrate / chromium-containing double metal hydroxide photoelectrode;

[0039] D. Take the newly prepared photoelectrod...

Example Embodiment

[0043] Example 3

[0044] A. Weigh 0.6694g of zinc nitrate hexahydrate, 0.1092g of potassium chromate, and 2.4264g of potassium nitrate dissolved in 100mL of deionized water to prepare a mixed salt solution;

[0045] B. Transfer the mixed salt solution of step A to a single-chamber electrolytic cell, where the working electrode has an area of ​​1.8 cm 2 TiO 2 The substrate, the counter electrode is a platinum wire electrode, the reference electrode is an Ag / AgCl electrode, connected to an electrochemical workstation, and the working electrode is applied with a potential of -0.4V for electrodeposition for 50 seconds, in which TiO 2 The preparation steps of the substrate are the same as in Example 1;

[0046] C. Take out the working electrode after the end, wash it thoroughly with deionized water, and dry it in an oven at 70°C for 1 hour to obtain a newly prepared semiconductor substrate / chromium-containing double metal hydroxide photoelectrode;

[0047] D. Take the newly prepared photoe...

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Abstract

The invention provides a semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode and a preparation method thereof. According to the invention, transition metal salt and potassium nitrate are added in chrome plating waste liquid to prepare an electrolyte, then is transferred into an electrolytic bath, the semiconductor substrate is taken as a work electrode, enables electro-deposition under room temperature, under negative potential, nitrate in a solution is reduced on the work electrode to generate hydroxyl, metal ions in the solution is reacted to hydroxyl, and then deposited on semiconductor surface, and the semiconductor substrate is performed with photoelectric chemical treatment in a phosphate buffer solution to obtain the semiconductor substrate/bimetallic alkaline phosphate photoelectrode. According to the invention, operation is sample, reaction condition is mild, chromium plating waste liquid is taken as a reaction raw material, and the method is suitable for high-efficiency recovery and high value utilization of metallic element in the chromium plating waste liquid. The semiconductor substrate/chromium-containing bimetallic alkaline phosphate photoelectrode can be directly used for a photo-electro-chemical catalysis reaction, and reaction performance is obviously increased.

Description

technical field [0001] The invention belongs to the field of metal resource recovery and high-value utilization, and specifically relates to the utilization of chromium and nickel resources in chromium plating waste liquid, and the preparation of a chromium-containing hydroxide-modified photoelectrode, which is used for water splitting driven by sunlight. Background technique [0002] Among the chromium in different valence states, hexavalent chromium is the most harmful, and its toxicity is about 100 times that of trivalent chromium. It can affect the oxidation and reduction of cells, and can combine with nucleic acids. Human body has carcinogenic effect [Zhu Jianhua. The toxicity of chromium in different valence states and its impact on human body. Environment and Development, 1997, 12(3):46-48.]. Chromium-containing wastewater in industrial production is considered to be an important source of serious harm to the environment. The concentration of chromium in untreated ele...

Claims

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Application Information

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IPC IPC(8): C25B11/04C02F1/461
CPCY02W10/33Y02W10/37
Inventor 项顼段雪何宛虹
Owner BEIJING UNIV OF CHEM TECH
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