Synchronous light-electricity sensing method for dark-field imaging-based solid nano channel
A nano-channel and dark-field imaging technology, applied in the field of electrochemical analysis technology and nano-spectroscopy, can solve the problems of influence of motion behavior, complicated labeling process, influence of single-molecule analysis results, etc., to achieve the effect of accelerating the detection rate and expanding the application field.
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[0049] Example 1
[0050] A method for optoelectronic synchronous sensing of solid-state nanochannels based on dark-field imaging, including the following steps (see figure 1 ):
[0051] (1) Preparation of semiconductor substrate films coated with metal nanocoatings
[0052] ① A layer of 100nm-thick silicon nitride film 3 is deposited on the single-crystal silicon wafer by chemical vapor deposition technology of micromachining technology, and then lithography is used to etch a square with a side length of 200 microns and a spacing of 5mm on one side of the single-crystal silicon circle. Window 4 to expose the silicon nitride film 3 ; a silicon circle is cut to obtain a substrate 5 including a single square window 4 .
[0053] The microfabrication techniques include chemical vapor deposition, photolithography, chemical etching, electron beam exposure, reactive ion beam etching, magnetron sputtering, electron beam evaporation, atomic layer deposition, molecular beam epitaxy, a...
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[0096] Example 2
[0097] A method for photoelectric synchronous sensing of solid-state nanochannels based on dark field imaging, comprising the following specific steps:
[0098] (1) Prepare a semiconductor substrate film coated with a metal nanocoating (same as Example 1).
[0099] (2) Preparation of metal-coated nanochannel chips (same as Example 1).
[0100] (3) Preparation of photoelectric detection microcell (same as Example 1).
[0101] (4) Dark-field imaging using metal-coated nanochannels
[0102] Dark-field imaging is performed on the metal-coated nanochannel chip 9 and the change of its spectrum within a certain period of time is continuously monitored. The specific contents are:
[0103] ①Place the photoelectric detection microcell on the microscope stage, perform transmission dark field illumination through the dark field lens, use a 100 W halogen lamp as the white light source, and use the microscope imaging device to image on the first color CCD camera.
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