Synthesis method of high-transparency polysulfone resin containing cycloalkyl group substituted phenol

A cycloalkane-based, polysulfone resin technology is applied in the field of industrial synthesis of high-transparency polysulfone resins, which can solve the problems of low transmittance of thin products, improved transparency of polysulfone plastics, and influence on popularization and application, and saves purchases. Cost, large market value, and the effect of good application prospects

Active Publication Date: 2016-02-17
JIANGMEN YOUJU NEW MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the defects of the existing technology and its own synthesis route, if the production process is not well controlled, polysulfone resin with high crystallinity will appear, which will lead to problems such as low transmittance and uneven color in the thin products processed and formed later. , the finished product rate of processing is greatly reduced, and the product performance is reduced, thus affecting its actual promotion and application
[0003] Chinese patent document CN1057783C discloses a polysulfone composition with very low luster and high light transmittance and products manufactured therefrom. This invention is by adding organic phosphorus stabilizer and organic fluorescent whitening agent to polysulfone products, Although the yellowness index and haze of the obtained product are very low, the polysulfone product itself is sensitive to additives, and problems such as aging and cracking will occur during long-term use
At present, there are many studies on the modification and enhancement of plastics by using various additives, but there are few studies on improving the transparency of polysulfone plastics from the formulation.

Method used

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  • Synthesis method of high-transparency polysulfone resin containing cycloalkyl group substituted phenol
  • Synthesis method of high-transparency polysulfone resin containing cycloalkyl group substituted phenol
  • Synthesis method of high-transparency polysulfone resin containing cycloalkyl group substituted phenol

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] In a 300-liter stainless steel reactor equipped with a nitrogen pipe, a condensation trap and a high-efficiency stirrer, add 100.0kg N-methylpyrrolidone first, then start stirring and raise the temperature to 80°C, add 35.0kg 4,4'-dichloride sequentially Diphenyl sulfone, 27.8 kg of bisphenol A, after the monomers are completely dissolved, add 14.0 kg of sodium carbonate to the system, and then add 60.0 liters of o-trimethylbenzene, continue to stir and heat up to 180 ℃, the salt formation reaction begins, the system is formed The water and o-trimethylbenzene azeotrope, the cooling water drips from the condenser tube, and the layers are separated in the water separator. After the upper o-trimethylbenzene turns from turbid to clear, continue to reflux for 20 minutes to ensure the complete salt formation reaction , The salt-forming stage is 1 hour, the solid content of the system in the salt-forming reaction stage is 25%; after the salt-forming is completed, all o-trimethyl...

Embodiment 2

[0036] Same as Example 1, except that N-methylpyrrolidone is 80.0 kg, 56.0 liters of m-trimethylbenzene, and 260 g of cycloalkane bisphenol (2), the solid content of the system in the polymerization reaction stage is 38%, and other conditions are the same.

[0037] The structure of cycloalkane bisphenol (2) is as follows:

[0038]

[0039] The obtained PSU resin melt index MI=14.0g / 10min (343.0°C, 2.16kg); the light transmittance is 96% (measured by ASTM D1003:2007).

[0040] Same as Example 1, except that N-methylpyrrolidone is 75.0 kg, 64.0 liters of mesitylene, 270 g of cycloalkane bisphenols (3), and the solid content of the system in the polymerization reaction stage is 40%, other conditions are the same.

[0041] The structure of cycloalkane bisphenol (3) is as follows:

[0042]

[0043] The obtained PSU resin melt index MI=16.0g / 10min (343.0°C, 2.16kg); the light transmittance is 97% (measured by ASTM D1003:2007).

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Abstract

The invention discloses a synthesis method of high-transparency polysulfone (PSU) resin containing cycloalkyl group substituted phenol. The method includes the steps of adding organic solvent in a nitrogen-protected reaction kettle with 4,4'-dichlorodiphenyi sulfone and bisphenol A as reaction monomers, wherein the mole ratio of 4,4'-dichlorodiphenyi sulfone to bisphenol A is 1 to 1; conducting stirring and temperature raising, sequentially adding the reaction monomers, adding a salt-forming agent and a water separation agent after all the monomers are dissolved, conducting stirring and temperature raising, and conducting the salt forming reaction for 1-2 hours; raising the temperature after the reaction ends, adding cycloalkyl group substituted phenol with the concentration of 0.1-5%, and conducting constant-temperature polymerization reaction for 4-5 hours to obtain polymerization mucus; cooling, smashing, washing and drying polymerization mucus to obtain the finished product. The method starts from the molecular structure level, cycloalkyl group substituted phenol is introduced into polymer molecular chains, the regularity of polymer chains is broken, the crystallization degree is lowered, and high-transparency polysulfone resin with ends capped by hydroxyl groups is prepared. The synthesized product keeps existing excellent performance of polysulfone, has the advantage of high light transmittance, and has better application prospects and great market value.

Description

Technical field [0001] The invention belongs to the technical field of polymer materials, and specifically relates to an industrial synthesis method of a highly transparent polysulfone resin containing a cycloalkane group substituted phenol. Background technique [0002] Polysulfone (PSU) is a thermoplastic engineering plastic with excellent mechanical properties, high rigidity, abrasion resistance, high strength, high thermal stability, high glass transition temperature, and maintains excellent mechanical properties even at high temperatures. It is resistant to hydrolysis, good dimensional stability, low molding shrinkage, non-toxic, radiation resistant, flame resistant, self-extinguishing, has excellent electrical properties in a wide temperature range, good chemical stability, and can withstand general acids, alkalis, Salt has long been widely used in the fields of electronics and electrical appliances, mechanical processing, automobiles, medical appliances, food processing an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G65/46C08G65/40
Inventor 王贤文
Owner JIANGMEN YOUJU NEW MATERIALS
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