Method for preparing organic perovskite methylamine lead iodide thin film from lead oxide thin film
A technology for preparing methylamino lead iodide and thin films is applied in the directions of lead organic compounds, ion implantation plating, coating, etc. Problems such as the inability to prepare a large area of film, to achieve the effect of simple process and improved film quality
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Embodiment example 1
[0020] Using pulsed laser deposition technology, the cavity vacuum is at 10 -3 Pa level, the laser energy is about 400 millijoules, the number of pulses is 1000 pulses, and the frequency is 10 Hz. At room temperature, lead oxide films are grown on fluorine-doped tin dioxide films using lead oxide as a target. The lead oxide thin film and the porcelain boat of methyl ammonium iodide powder are sealed and placed in a box for 50 minutes at a constant temperature of 210 degrees Celsius. The organic perovskite methylamine lead iodide film sample was formed by reacting the lead oxide film with the atmosphere of methylammonium iodide. X-ray diffraction was used to confirm that the film finally grown by this method was a pure phase organic perovskite methylamine iodide For the lead oxide thin film, the crystal grains of the scanning electron microscope are observed to be very large and reach the order of microns, and the thickness of the film is determined to be about 1.55 microns thr...
Embodiment example 2
[0022] Using magnetron sputtering technology, the chamber vacuum is 10 -3 Pa, sputtering power 150 watts, growth time 20 minutes, using lead oxide as the target to grow lead iodide film on fluorine-doped tin dioxide film, the film thickness is 300 nanometers, and the grown lead oxide and methyl ammonium iodide Put the powder into a tube furnace and heat it at a constant temperature of 180 degrees Celsius for 15 minutes to allow the methylamine iodide atmosphere to react with the lead oxide film on the substrate to form an organic perovskite methylamine lead iodide film.
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