A kind of high temperature resistant polysiloxane containing conjugated structure in main chain and preparation method thereof
A technology of conjugated structure and polysiloxane, which is applied in the field of high-temperature-resistant polysiloxane and its preparation, can solve the problems that cannot meet the heat-resistant requirements of silicone rubber, achieve wide application range, improve heat resistance and stability sexual effect
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Embodiment 1
[0029] (1) Add 1.1 mol of boric acid and 0.5 mol of solvent diethylene glycol dimethyl ether in a beaker, add in a 100 mL four-necked flask after dissolving, then add 1 mol of maleic anhydride dropwise, ventilate nitrogen, and heat up to 120°C, with mechanical stirring at a speed of 450r / min, stirring and reacting for 5h.
[0030] (2) Cool down the reactor to 60° C., add 0.2 mol of hydrochloric acid, then dropwise add 2 mol of dimethyldichlorosilane, and react for 2 hours. Add K2CO3 to adjust the pH value to 6.5, remove the inorganic substance KCl, then add 0.02 mol of hexamethyldisiloxane dropwise for capping, and react for 4 hours. Reduce the pressure until the gauge pressure of the vacuum pump is -0.05MPa, and exclude low boiling substances. A polyborosiloxane containing a conjugated structure is obtained. Its heat resistance reaches 480°C. Take 100 parts of the product and 5 parts of dicumyl peroxide and keep the temperature at 110°C for 3 hours, and the heat resistance...
Embodiment 2
[0032] (1) Add 1.1mol of boric acid in a beaker, 0.5mol of solvent diethylene glycol dimethyl ether, dissolve and add in a 100mL four-necked flask, then add 1mol of fumaryl chloride dropwise, nitrogen, and heat up to 120°C, with mechanical stirring at a speed of 450r / min, stirring and reacting for 5h.
[0033] (2) Cool down the reactor to 60° C., add 0.1 mol of sulfuric acid, then dropwise add 2 mol of dimethyldimethoxysilane, and react for 2 hours. Add K2CO3 to adjust the pH value to 6.5, remove the inorganic substance KCl, then add 0.02 mol of hexamethyldisiloxane dropwise for capping, and react for 4 hours. Reduce the pressure until the gauge pressure of the vacuum pump is -0.05MPa, and exclude low boiling substances. A polyborosiloxane containing a conjugated structure is obtained. Its heat resistance reaches 485°C. Take 100 parts of the product and 5 parts of dicumyl peroxide and keep the temperature at 110°C for 3 hours, and the heat resistance of the prepared silicon...
Embodiment 3
[0035] (1) Add 1.1 mol of phenylboronic acid ester and 0.5 mol of triglyme as a solvent in a beaker, dissolve it and add it to a 100 mL four-neck flask, then add 1 mol of phthalic anhydride dropwise, pass through nitrogen, and Under the atmosphere, the temperature was raised to 120° C., mechanically stirred at a speed of 450 r / min, and stirred for 5 hours.
[0036] (2) Cool down the reactor to 60° C., add 0.1 mol of sulfuric acid, dropwise add 2 mol of dimethyldimethoxysilane, and react for 2 hours. Add K2CO3 to adjust the pH value to 6.5, remove the inorganic substance KCl, then add 0.02 mol of hexamethyldisiloxane dropwise for capping, and react for 4 hours. Reduce the pressure until the gauge pressure of the vacuum pump is -0.05MPa, and exclude low boiling substances. A polyborosiloxane containing a conjugated structure is obtained. Its heat resistance reaches 500°C. Take 100 parts of the product and 5 parts of dicumyl peroxide and keep the temperature at 110°C for 3 hou...
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