Doped metal diamond-like coating preparation method and its products

Abstract

The invention discloses a preparation method of a metal-doped diamond-like coating and a product thereof. The coating is deposited on the surface of a matrix material. The diamond-like coating is primarily deposited by means of a PAVCD technology of motivating plasmas to be activated by means of arc electron stream. Electrons in arc ion plating discharge process are extracted by means of an anode,so that the density and strength of the plasma are enhanced, and the ionization rate of carbon particles is enhanced. A gauze element baffle plate with a suspended potential is assembled in front ofan arc ion plating device, so that the diamond-like coating doped with metals is formed on the surface of the matrix. The diamond-like coating prepared in the process is doped with metals, so that theinternal stress can be removed effectively, and the bonding strength is good.

Description

technical field [0001] The invention belongs to the field of preparation of vacuum coatings, in particular to a method for preparing a metal-doped diamond-like coating and products thereof. Background technique [0002] Friction and wear of solid materials generally exist in various fields of production and life, and friction and wear exist in all relative moving parts. Statistics at home and abroad show that the energy consumed by friction accounts for 1 / 3 of the world's primary energy, about 80% of mechanical parts eventually fail due to continuous wear and tear, and about 50% of mechanical equipment vicious accidents Occurs due to lubrication failure and excessive wear. The physical, chemical and mechanical properties of the material surface have an important impact on the tribological properties of the material. After the surface of the solid material is pretreated, it is then subjected to surface coating, surface modification or composite treatment of various surface ...

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Problems solved by technology

[0007] The existing DLC ​​deposition technologies are mainly physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD mainly includes ion beam deposition (IBD), magnetron sputtering, arc ion plating, pulsed laser deposition, etc. CVD includes hot wire Chemical vapor deposition and plasma chemically enhanced vapor deposition (PECVD) have some problems: ion beam deposition has low sputtering rate and low deposition rate due to graphite sputtering; magnetron sputtering deposition has low sputtering rate on the one hand and low On the one hand, low atomic energy leads to loose structure and low hardness; a large amount of carbon particles will be produced during arc ion plating deposition; pulsed laser deposition has high energy consumption, poor coating uniformity, and small effective deposition area; hot wire vapor deposition technology has high deposition temperature, which greatly The range of matrix materials is limited; although PECVD effectively reduces the reaction temperature, the deposition efficiency is low during the deposition process, the ionization rate of carbon atoms is low, and the film quality structure is not dense enough

[0008] The existing DLC ​​metal doping process mainly uses magnetron sputtering or arc source to dope directly in the process of depositing DLC: but magnetron sputtering is atomic state, low ionization rate, surface migration and diffusion The ability is low and the deposition efficiency is low, which affects the film formation speed and quality of DLC coatings; while the metal doping of arc ion plating is mainly through metal carbide arc discharge. On the one hand, large particles in the arc discharge process are difficult to eliminate, and on the other hand On the one hand, this preparation method obtains a metal-based DLC coating with a low percentage of DLC, mainly wear-resistant metal carbides

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