Method for FTrPSA (full temperature range-pressure swing adsorption) hydrogen production recycling of high-concentration ammonia-containing tail gas from LED-MOCVD (light emitting diode-metal oxide chemical vapor deposition) processing

A pressure swing adsorption, high concentration technology, applied in separation methods, chemical instruments and methods, hydrogen separation, etc., can solve problems such as difficult recycling, achieve the effect of reducing exhaust emissions, good activity and diffusivity, and solving technical bottlenecks
CN108609583AActive Publication Date: 2018-10-02SICHUAN TECHAIRS

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SICHUAN TECHAIRS
Publication Date
2018-10-02

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Abstract

The invention discloses a method for FTrPSA (full temperature range-pressure swing adsorption) hydrogen production recycling of high-concentration ammonia-containing tail gas from LED-MOCVD (light emitting diode-metal oxide chemical vapor deposition) processing. By the process of pretreatment, ammonia thermal cracking, fine deamination, pressure swing adsorption based hydrogen extraction and hydrogen purification, high-concentration ammonia-containing waste gas from the LED-MOCVD processing is subjected to thermal cracking and purification to meet the electronic grade hydrogen standard required by the LED-MOCVD processing, the waste gas is recycled, and the hydrogen yield is higher than or equal to 80%-90%. The technical problem that recycled normal-pressure or low-pressure high-concentration ammonia-containing waste gas from the LED-MOCVD processing cannot return to the LED-MOCVD processing to be used is solved, and the blank in green and circular economy development of the LED industry is filled up.
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Description

technical field

[0001] The invention relates to the electronic environmental protection field of comprehensive utilization of ammonia-containing (NH3) waste gas in the manufacturing process of semiconductor light-emitting diodes (LEDs), in particular to a full-temperature-range pressure-swing adsorption hydrogen production reuse of high-concentration ammonia-containing tail gas in the LED-MOCVD process method. Background technique

[0002] MOCVD (Metal Oxide Chemical Vapor Deposition) process (equipment) is a modern method and means for the research and production of compound semiconductor materials, especially as a method and equipment for the industrial production of new light-emitting materials-light-emitting diodes (LEDs). Its high quality , high stability, high repeatability and large scale are irreplaceable by other semiconductor material growth methods and equipment. It is the main method and means of producing optoelectronic devices and microwave device materials in ...

Claims

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