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Preparation process for preparing Cr coating on surface of zirconium alloy substrate for nuclear application

A technology of substrate surface and preparation process, which is applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of low use efficiency and achieve the effects of safe use, excellent performance and excellent binding force

Active Publication Date: 2019-07-26
NUCLEAR POWER INSTITUTE OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is that in the preparation process of the existing Cr coating on the surface of the zirconium alloy, the obtained coating cannot maintain good bonding force, high temperature oxidation resistance and corrosion resistance under thicker thickness. , the use efficiency is low, and the purpose is to provide a preparation process for preparing a Cr coating on the surface of a zirconium alloy substrate for nuclear use, so as to solve the problem of preparing a Cr coating on the surface of a zirconium alloy

Method used

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  • Preparation process for preparing Cr coating on surface of zirconium alloy substrate for nuclear application
  • Preparation process for preparing Cr coating on surface of zirconium alloy substrate for nuclear application
  • Preparation process for preparing Cr coating on surface of zirconium alloy substrate for nuclear application

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Embodiment 1

[0027] Such as Figure 1~4 Shown, a kind of preparation technology that the present invention prepares Cr coating on nuclear zirconium alloy substrate surface comprises the following steps:

[0028] (1) Polish the zirconium alloy square piece with 240#, 600#, 1000#, 1500#, 3000# water-grinding sandpaper from coarse to fine, and finally use polishing paste to polish on a metallographic polishing machine. After polishing, use Use acetone and alcohol ultrasonic cleaning for 15-20 minutes;

[0029] (2) Place the zirconium alloy sheet after the above treatment in the vacuum furnace chamber of the ultra-high vacuum magnetron sputtering equipment, and wait until the vacuum degree reaches the background vacuum of 2 × 10 -4 After Pa, pass the gas and clean it with bias backsplash for 10 minutes. The backsplash bias voltage is -700V, the working atmosphere is Ar, and the working vacuum is 2Pa;

[0030] (3) After the back-sputter cleaning of the substrate surface is completed, the Cr t...

Embodiment 2

[0034] (1) Substrate surface polishing and cleaning: use 800-5000 mesh water sandpaper and polishing flannelette to perform surface grinding and polishing on the substrate sample in sequence until the mirror surface roughness Ra is less than 10nm; Powder aqueous solution, saturated Na2CO3 aqueous solution, acetone, absolute ethanol, and deionized water were ultrasonically cleaned for 15 minutes, and the substrate sample was blown dry with N2 gas after completion;

[0035](2) Place the cleaned substrate sample in a vacuum chamber for plasma bias backsplash cleaning. The process parameters are: background vacuum 5×10 -4 Pa, backsplash bias voltage is 200V, backsplash air pressure is 1.0Pa, backsplash time is 20min;

[0036] (3) Using an ultra-high vacuum multi-target magnetron sputtering coating machine to deposit a nanometer gradient coating on the surface of the substrate, the background vacuum of the coating machine is 5 × 10 -4 Pa, deposition temperature 200°C, specifically...

Embodiment 3

[0038] (1) Substrate surface polishing and cleaning: use 800-5000 mesh water sandpaper and polishing flannelette to perform surface grinding and polishing on the substrate sample in sequence until the mirror surface roughness Ra is less than 10nm; Powder aqueous solution, saturated Na2CO3 aqueous solution, acetone, absolute ethanol, and deionized water were ultrasonically cleaned for 15 minutes, and the substrate sample was blown dry with N2 gas after completion;

[0039] (2) Place the cleaned substrate sample in a vacuum chamber for plasma bias backsplash cleaning. The process parameters are: background vacuum 5×10 -4 Pa, backsplash bias voltage is 200V, backsplash air pressure is 1.0Pa, backsplash time is 20min;

[0040] (3) Using an ultra-high vacuum multi-target magnetron sputtering coating machine to deposit a nanometer gradient coating on the surface of the substrate, the background vacuum of the coating machine is 5 × 10 -4 Pa, the deposition temperature is 200°C, afte...

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Abstract

The invention discloses a preparation process for preparing a Cr coating on the surface of a zirconium alloy substrate for nuclear application. The zirconium alloy substrate is ground, finally polishing processing is conducted on a metallographic phase polishing machine through polishing paste, and after the zirconium alloy substrate is polished to be smooth, washing is conducted on greasy dirt onthe surface of a zirconium alloy sheet; the zirconium alloy sheet is arranged in a vacuum furnace cavity of an ultrahigh vacuum magnetron sputtering device, and after the vacuum degree reaches the background vacuum 2*10<4> Pa, gas is injected, and bias voltage backwash washing is conducted for 10 minutes; after the backwash washing of the surface of the base sheet is completed and a Cr target israpidly started through a radio-frequency power supply, a baffle is closed, and pre-sputtering is conducted on the surface of the target for 10 minutes to remove surface oxide or adsorption impurities; the Cr target baffle is opened to conduct Cr coating deposition; and under the condition that a vacuum system is not turned off, the zirconium alloy is subjected to furnace cooling till the temperature is 100 DEG C or below, and distressing and deformation correcting processing is conducted. According to the preparation process, due to the adoption of the magnetron sputtering technology, the Crcoating with high binding force and high thickness is deposited on the zirconium alloy substrate for nuclear application.

Description

technical field [0001] The invention relates to the field of metal surface modification, in particular to a preparation process for preparing a Cr coating on the surface of a zirconium alloy substrate for nuclear use. Background technique [0002] Zirconium alloy cladding exhibits good radiation resistance and corrosion resistance and has been successfully used in light water reactors (LWR). ) conditions, the high-temperature oxidation of the zirconium alloy cladding will release a large amount of hydrogen and heat, causing a serious nuclear accident, resulting in the leakage of a large amount of radioactive substances, and bringing catastrophic consequences to the human living environment, such as the "Fukushima Nuclear Power Plant Accident" in 2011. The research on accident-resistant cladding materials mainly focuses on the development of new accident-tolerant materials (ATF) to replace traditional zirconium alloys. The accident-tolerant materials are required to be used u...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/35C23C14/02
CPCC23C14/028C23C14/165C23C14/35
Inventor 张瑞谦刘春海杨红艳韦天国彭小明杜沛南王昱
Owner NUCLEAR POWER INSTITUTE OF CHINA
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