Tungsten oxide and titanium oxide composite film of tin oxide photonic crystal loaded mesoporous core-shell structure and preparation method and application of tungsten oxide and titanium oxide composite film
A technology of photonic crystals and composite thin films, which is applied in photovoltaic power generation, semiconductor devices, and final product manufacturing, can solve problems such as reducing the band gap, photogenerated electron-hole instability, and low utilization of sunlight, and achieves equipment And the preparation process is simple, the cost is low, and the effect of improving life
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Embodiment 1
[0031] 1. Cleaning of the FTO conductive glass substrate: soak the FTO conductive glass in a piranha solution (concentrated sulfuric acid and 30% hydrogen peroxide), then rinse it with deionized water until neutral to obtain a clean FTO glass;
[0032] 2. Soak the clean conductive surface of FTO glass in a polystyrene solution at a constant temperature of 60°C for 20h, then soak it in a 0.5mol / L tin chloride solution, and anneal at 450°C for 2h to obtain a tin oxide photonic crystal;
[0033] 3. Use 40ml of methanol as the solvent, 0.1g of tungsten chloride as the tungsten source, and 0.75ml of isopropyl titanate as the titanium source to prepare the reaction precursor;
[0034] 4. Then put the tin oxide photonic crystal into the inner tank of the autoclave, pour the configured precursor solution into the inner tank of the autoclave, seal it and put it in the blast drying oven, and react at a constant temperature of 100°C for 6 hours. After the solvothermal reaction , and then...
Embodiment 2
[0037] 1. Cleaning of FTO conductive glass substrate: Soak the FTO conductive glass in piranha solution, and then rinse it with deionized water until neutral to obtain a clean FTO glass;
[0038] 2. Soak the clean conductive surface of FTO glass in a polystyrene solution at a constant temperature of 60°C for 20 hours, then soak it in a 0.7mol / L tin chloride solution, and anneal at 450°C for 2 hours to obtain a tin oxide photonic crystal;
[0039] 3. Use 30ml of methanol as the solvent, 0.1g of tungsten chloride as the tungsten source, and 0.5ml of isopropyl titanate as the titanium source to prepare the reaction precursor;
[0040] 4. Then put the tin oxide photonic crystal into the inner tank of the autoclave, pour the prepared precursor solution into the inner tank of the autoclave, seal it and put it in a blast drying oven, and react at a constant temperature of 100°C for 6 hours. After the solvothermal reaction, it was put into a muffle furnace for annealing at 475°C for 2...
Embodiment 3
[0042] 1. Cleaning of FTO conductive glass substrate: Soak the FTO conductive glass in piranha solution, and then rinse it with deionized water until neutral to obtain a clean FTO glass;
[0043] 2. Soak the clean conductive surface of FTO glass in polystyrene solution at 55°C for 30h, then soak in 0.8mol / L tin chloride solution, and anneal at 450°C for 2h to obtain tin oxide photonic crystals;
[0044]3. Use 30ml of methanol as the solvent, 0.1g of tungsten chloride as the tungsten source, and 1ml of isopropyl titanate as the titanium source to configure the reaction precursor;
[0045] 4. Then put the tin oxide photonic crystal into the inner tank of the autoclave, pour the prepared precursor solution into the inner tank of the autoclave, seal it and put it in a blast drying oven, and react at a constant temperature of 100°C for 6 hours. After the solvothermal reaction, it was put into a muffle furnace for annealing at 475° C. for 2 hours to prepare a composite film of tungs...
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