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Compact titanium diboride coating, preparation method of compact titanium diboride coating and application of compact titanium diboride coating

A titanium diboride and coating technology, applied in the field of dense titanium diboride coating and its preparation, can solve the problem of poor high temperature friction and wear performance of the coating, insufficiently dense grain structure of the coating, and adhesion between the coating and the substrate. It can reduce friction and wear, promote equiaxed crystal growth, and reduce metal adhesion.

Active Publication Date: 2019-11-22
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the application of DC magnetron sputtering TiB 2 Usually grows in a columnar crystal structure, making TiB 2 The grain structure of the coating is not dense enough, and the generated TiB 2 The coating stress is greater and the brittleness is greater, which makes TiB 2 The bonding force between the coating and the substrate is poor, so TiB 2 The high-temperature friction and wear properties of the coating are poor, which greatly limits its application in actual industry

Method used

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  • Compact titanium diboride coating, preparation method of compact titanium diboride coating and application of compact titanium diboride coating
  • Compact titanium diboride coating, preparation method of compact titanium diboride coating and application of compact titanium diboride coating
  • Compact titanium diboride coating, preparation method of compact titanium diboride coating and application of compact titanium diboride coating

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Embodiment 1

[0037] S1. Preparation of composite coating machine: In this implementation, an ion beam composite magnetron sputtering coating machine is selected, including a vacuum chamber, a magnetron sputtering source, an ion source and a workpiece support that can be rotated at the same time. Magnetron sputtering source loaded with 99.8% pure TiB 2 target;

[0038] S2. Substrate YT15 tungsten-cobalt-titanium alloy (WC-TiC-Co) pre-cleaning treatment: use alcohol to ultrasonically clean the sample (substrate) to be coated, then rinse with deionized water, and dry with dry compressed air;

[0039] S3. Use ion beam etching to clean the surface of the sample in the vacuum chamber: place the base YT15 tungsten-cobalt-titanium alloy on the workpiece support of the vacuum chamber, and evacuate the vacuum chamber to 5.0×10 –3 Below Pa, turn on the ion source, pass 150sccm of argon gas into the ion source, set the ion source current to 20A, set the workpiece support bias to -650V, and the workin...

Embodiment 2

[0045] S1. Preparation of composite coating machine: In this implementation, an ion beam composite magnetron sputtering coating machine is selected, including a vacuum chamber, a magnetron sputtering source, an ion source and a workpiece support that can be rotated at the same time. Magnetron sputtering source loaded with 99.8% pure TiB 2 target;

[0046] S2. Substrate YT15 tungsten-cobalt-titanium alloy (WC-TiC-Co) pre-cleaning treatment: use alcohol to ultrasonically clean the sample (substrate) to be coated, then rinse with deionized water, and dry with dry compressed air;

[0047] S3. Use ion beam etching to clean the surface of the sample in the vacuum chamber: place the base YT15 tungsten-cobalt-titanium alloy on the workpiece support of the vacuum chamber, and evacuate the vacuum chamber to 5.0×10 –3 Below Pa, turn on the ion source, pass 120sccm argon gas into the ion source, set the ion source current to 15A, set the workpiece support bias to -600V, and the working t...

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Abstract

The invention belongs to the technical field of surface protection, and discloses a compact titanium diboride coating, a preparation method of the compact titanium diboride coating and application ofthe compact titanium diboride coating. The titanium diboride coating sequentially comprises a Ti transition layer, a Tin overplating layer and a TiB2 layer, wherein titanium diboride existing in the TiB2 layer is in the form of (001) preferentially oriented nano-isometric crystal; the grain diameter of the isometric crystal is 2-5 nm; the titanium diboride coating is prepared by taking a TiB2 target as a raw material and adopting a magnetron sputtering composite ion beam etching method by a coating mechanism; and the coating machine comprises a vacuum chamber, a magnetron sputtering source, anion source and workpiece supports capable of rotating at the same time. The TiB2 coating has excellent toughness and compact structure; and the compact titanium diboride coating and the preparation method have the advantages of being simple in process, high in film forming quality, stable in performance, extremely high in hardness and excellent in friction wear resistance, and widely applicable to protecting the surfaces of products such as machinery and molds.

Description

technical field [0001] The invention belongs to the technical field of surface protective coatings, and more particularly relates to a dense titanium diboride coating and a preparation method and application thereof. Background technique [0002] Transition metal boride TiB 2 The coating has a series of excellent physical and chemical properties, such as high hardness value, strong inertness, high wear resistance and corrosion resistance, excellent chemical stability, making TiB 2 The coating has huge potential application advantages in many high temperature and harsh environments. At present, TiB 2 The preparation of coatings mainly includes CVD, PVD, thermal spraying, ion beam assisted deposition and electron beam evaporation, but due to the highly toxic borane gas, it is difficult to use in TiB. 2 Reactive magnetron sputtering is rarely used in the preparation of . The main way to prepare by PVD method is to sputter solid TiB 2 Target preparation, using DC magnetron s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/16C23C14/06C23C14/02
CPCC23C14/0036C23C14/022C23C14/0641C23C14/067C23C14/165C23C14/35
Inventor 代伟梁云鹏王启民刘凡
Owner GUANGDONG UNIV OF TECH
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