Ultraviolet light-emitting element and all-inorganic packaging method
An encapsulation method and inorganic technology, applied in electrical components, semiconductor devices, circuits, etc., can solve the problems affecting the use effect of UV-LED, the yellowing failure of organic substances, and the decrease of the light transmittance of the lens, and achieve low cost and air tightness. Good, size reduction effect
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Embodiment 1
[0033] An all-inorganic encapsulation method, specifically as follows:
[0034] S01 substrate grinding and polishing
[0035] A 4-inch sapphire is selected as the substrate 1, and the substrate 1 is ground and polished to reduce its roughness. Firstly, the substrate 1 is ground and thinned to 0.3-0.8mm by using a plane precision polishing machine, asphalt polishing mold and cerium oxide polishing powder with an average particle size of 60nm; then, using a plane precision polisher, a polyurethane polishing film and an average particle A 30nm alkaline polishing solution (composed of 20% silica hydrosol, alkaline agent and surfactant) was used to roughly polish the substrate 1 for 2 minutes, and then a flat precision polishing machine, a fiber polishing film and an average grain size were used. The alkaline polishing solution with a diameter of 30nm (composed of 20% silica hydrosol, alkaline agent and surfactant) was used to polish the substrate 1 for 2 minutes, and finally the ...
Embodiment 2
[0052] An all-inorganic encapsulation method, specifically as follows:
[0053] S01 Form copper clad ceramic substrate
[0054] A copper-clad alumina ceramic substrate 6 is selected, and the surface is sequentially plated with a nickel layer and a gold layer as the metal coating layer 7 of the substrate 6 . The ceramic substrate 6 is sintered with alumina powder. After a series of steps such as laser opening, sputtering copper plating, covering photoresist, exposure and development, electroplating or electroless plating to thicken the copper layer, and etching to remove the film, the pads of the substrate 6 are completed. 602 and the copper dam 601 are fabricated to form the copper-clad ceramic substrate 6. A metal coating is formed on the upper surface of the dam 601 of the substrate 6 by means of electroplating, first with 5 μm of nickel, and then with 0.3 μm of gold.
[0055] S02 Die Bonding
[0056] The UV-LED chip 9 is selected, the electrode of the UV-LED chip 9 is Au...
Embodiment 3
[0071] An all-inorganic encapsulation method, specifically as follows:
[0072] S01 substrate grinding and polishing
[0073] A 4-inch sapphire is selected as the substrate, and the substrate is ground and polished to reduce its roughness. Firstly, the substrate is ground and thinned to 0.3-0.8mm by using a plane precision polishing machine, asphalt polishing mold and cerium oxide polishing powder with an average particle size of 60nm. Then, a plane precision polisher, polyurethane polishing film and average particle size of 30nm alkaline polishing solution (composed of 20% silica hydrosol, alkaline agent and surfactant) was used to roughly polish the substrate for 2 minutes, and then a flat precision polishing machine, fiber polishing film and average particle size of 30nm alkaline polishing solution (composed of 20% silica hydrosol, alkaline agent and surfactant) is used to polish the substrate for 2 minutes, and finally the surface roughness of the substrate is less than 1...
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