Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polishing solution for metal material, polishing grinding disc and polishing method

A technology for polishing abrasive discs and polishing liquids, applied in polishing compositions containing abrasives, metal processing equipment, grinding/polishing equipment, etc., can solve the problems of restricting the application of aluminum alloy mirrors, difficult to polish surfaces, etc., and achieve a simple structure , high quality polishing, easy effect of raw materials

Pending Publication Date: 2021-10-22
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, because the aluminum alloy material is relatively soft compared to traditional glass and other materials, and because the aluminum alloy contains other metal components, it is difficult to obtain a high-quality polished surface with traditional polishing
However, the method of plating nickel-phosphorus metal layer on the surface will bring "bimetal effect", which restricts the application of aluminum alloy reflectors in space systems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing solution for metal material, polishing grinding disc and polishing method
  • Polishing solution for metal material, polishing grinding disc and polishing method
  • Polishing solution for metal material, polishing grinding disc and polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Embodiment 1, the metal material of aluminum alloy material is processed:

[0035] A kind of polishing liquid of metallic material, is made up of the following components by weight, comprises:

[0036] 75 parts of water-based carrier liquid, 5 parts of polishing powder, 6.5 parts of surfactant, 5 parts of oxidizing agent, 0.2 part of pH regulator, and 0.1 part of defoamer; among them, the water-based carrier liquid is deionized water; the polishing powder is alumina Granules; surfactants are ethylene glycol and triethanolamine; oxidants are hydrogen peroxide; pH regulators are L-malic acid and sodium carbonate; defoamers are polyether defoamers.

[0037] The present invention provides a preferred embodiment, wherein the aluminum oxide particles are round particles with a diameter of 0.5 μm.

[0038] The present invention provides a preferred embodiment, the pH value of the polishing liquid is 6.5-7.5.

[0039] The present invention provides a preferred embodiment, the...

Embodiment 2

[0052] Embodiment 2, processing the metal material of pure aluminum material:

[0053] A kind of polishing liquid of metallic material, is made up of the following components by weight, comprises:

[0054] 80 parts of water-based carrier liquid, 5 parts of polishing powder, 6 parts of surfactant, 3 parts of oxidizing agent, 0.25 parts of pH regulator, and 0.1 part of defoamer; among them, the water-based carrier liquid is deionized water; the polishing powder is alumina Granules; surfactants are ethylene glycol and triethanolamine; oxidants are hydrogen peroxide; pH regulators are L-malic acid and sodium carbonate; defoamers are polyether defoamers.

[0055] The present invention provides a preferred embodiment, wherein the aluminum oxide particles are round particles with a diameter of 0.5 μm.

[0056] The present invention provides a preferred embodiment, the pH value of the polishing solution is 7.

[0057] The present invention provides a preferred embodiment, the mass f...

Embodiment 3

[0069] Embodiment 3, the metal material of 304 stainless steel materials is processed:

[0070] A kind of polishing liquid of metallic material, is made up of the following components by weight, comprises:

[0071] 75 parts of water-based carrier liquid, 5 parts of polishing powder, 6.5 parts of surfactant, 1 part of oxidizing agent, 0.2 part of pH regulator, and 0.1 part of defoamer; among them, the water-based carrier liquid is deionized water; the polishing powder is alumina Granules; surfactants are ethylene glycol and triethanolamine; oxidants are hydrogen peroxide; pH regulators are L-malic acid and sodium carbonate; defoamers are polyether defoamers.

[0072] The present invention provides a preferred embodiment, wherein the aluminum oxide particles are round particles with a diameter of 0.5 μm.

[0073] The present invention provides a preferred embodiment, the pH value of the polishing liquid is 6.75.

[0074] The present invention provides a preferred embodiment, t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention provides a polishing solution which is prepared from the following components in parts by weight: 75-80 parts of water-based carrier liquid; 3-5 parts of polishing powder; 5-10 parts of a surfactant; 0.5-5 parts of an oxidizing agent; 0.2-0.4 part of a pH regulator; and 0.1-0.3 part of a defoaming agent. The polishing powder is alumina particles; the surfactant is polyhydric alcohol and alcohol ammonium salt; the oxidant is hydrogen peroxide; the pH regulator is sodium carbonate and organic acid; the defoaming agent is a polyether defoaming agent. The polishing performance of the polishing solution is not affected by the polishing time, deterministic removal can be carried out on the metal surface according to the machining path and the planning time, and rapid improvement of the surface shape precision is achieved. Besides, the polishing solution is simple in preparation method, safe, pollution-free, low in cost and easy to clean, and raw materials are easy to obtain.

Description

technical field [0001] The invention belongs to the field of metal surface processing, and in particular relates to a polishing liquid for polishing metal materials, a polishing disc and a polishing method. Background technique [0002] The content of aluminum in the earth's crust is second only to oxygen and silicon, and is the most abundant metal element in the earth's crust. Aluminum alloys have very high reflectivity over a broad spectral range of infrared, visible, and all the way into ultraviolet light, making them a good choice for multispectral imaging applications. Aluminum products and aluminum alloy products have the characteristics of high specific stiffness, high specific modulus, light weight, good ductility, good thermal conductivity, and strong corrosion resistance. It is widely used in hardware. [0003] At present, aluminum alloy reflectors are mostly processed by single-point diamond turning, but the surface precision after turning can only reach the mic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09G1/02B24B1/00B24B41/04
CPCC09G1/02B24B1/00B24B41/04
Inventor 白杨张志宇罗霄王孝坤张学军
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com