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Deposition system for Si-doped multi-layer DLC coating on surface of special-shaped part and method of deposition system

A technology of deposition system and deposition method, which is applied in the field of deposition system of Si-doped multi-layer DLC coating on the surface of special-shaped parts, can solve the problems of unsuitability for industrial promotion, low utilization rate, high price, etc., and achieve large industrial application value, The effect of prolonging the service life and simplifying the installation

Pending Publication Date: 2021-10-22
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Chinese Patent Publication Nos. CN 101210310 and CN 207418848 report the preparation technology of DLC coating on special-shaped parts. However, in order to ensure the deposition of DLC film, a sample holder that can rotate uniformly is first required, which will cause additional energy loss.
The rotation of the sample holder includes the rotation of the main axis and the rotation of the secondary axis. Therefore, during the rotation process, the sample is easy to fall, and the requirements for fixing the sample are relatively high; secondly, PVD technology is used for carbon source and other doping for DLC film deposition The element source is an expensive target material with low utilization rate; third, the deposition of element-doped DLC film is easy to cause graphite target poisoning, and the contamination on the surface of the target material is difficult to remove; fourth, the operation of these devices is relatively complicated, and the process More cumbersome, not suitable for industrial promotion

Method used

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  • Deposition system for Si-doped multi-layer DLC coating on surface of special-shaped part and method of deposition system
  • Deposition system for Si-doped multi-layer DLC coating on surface of special-shaped part and method of deposition system
  • Deposition system for Si-doped multi-layer DLC coating on surface of special-shaped part and method of deposition system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] Example 1 A multi-layer Si-doped DLC coating was deposited on the surface of M2 high-speed steel (30 mm×30 mm×3 mm), and the specific deposition process was as follows:

[0050] (1) Soak the M2 high-speed steel sheet in petroleum ether, acetone, alcohol, and deionized water for 20 minutes to remove surface oil; then dry it with nitrogen to obtain a sample.

[0051] (2) The sample is hung on the sample holder 4, and placed in the vacuum chamber 1, and the auxiliary cathode 3 is placed on the periphery, and the vacuum is sealed to 3×10 -3 Pa.

[0052] (3) Introduce argon gas, apply a negative bias voltage to the auxiliary cathode 3 by using a high-voltage pulsed DC power supply, and generate high-density argon plasma inside it to bombard and clean the surface of the sample and preheat it. Deposition conditions: the argon gas flow rate is 150 sccm, the negative bias voltage is 6 kV, the pulse frequency is 1.5 kHz, the gas pressure is 5 Pa, and the processing time is 25 m...

Embodiment 2

[0061] Embodiment 2 Depositing a multi-layer Si-doped DLC coating on the bearing surface, the specific deposition process is as follows:

[0062] ⑴Soak the bearing in petroleum ether, acetone, alcohol and deionized water for 20 minutes to remove surface oil; then dry it with nitrogen.

[0063] (2) The bearing is suspended on the sample holder 4 and placed in the vacuum chamber 1, and an auxiliary cathode 3 is coaxially placed on the periphery and is insulated from the sample and applied with a negative bias of 800 V, and the vacuum is sealed to 3×10 -3 Pa.

[0064] (3) Introduce argon gas, apply a negative bias voltage to the auxiliary cathode 3 by using a high-voltage pulsed DC power supply, and generate high-density argon plasma inside it to bombard and clean the surface of the sample and preheat it. Deposition conditions: the argon gas flow rate is 200 sccm, the negative bias voltage is 8 kV, the pulse frequency is 1.5 kHz, the gas pressure is 6 Pa, and the processing tim...

Embodiment 3

[0067] Example 3 A multi-layer Si-doped DLC coating was deposited on the surface of a drill bit (11.5 cm×8 mm). The specific deposition process is as follows:

[0068] (1) Soak the drill bit in petroleum ether, acetone, alcohol, and deionized water for 20 minutes to remove surface oil; then dry it with nitrogen.

[0069] (2) The drill bit is suspended on the sample holder 4 and placed in the vacuum chamber 1. An auxiliary cathode 3 insulated from the sample is coaxially placed on the periphery, and the vacuum is sealed to 3×10 -3 Pa.

[0070] (3) Introduce argon gas, apply a negative bias voltage to the auxiliary cathode 3 by using a high-voltage pulsed DC power supply, and generate high-density argon plasma inside it to bombard and clean the surface of the sample and preheat it. Deposition conditions: argon gas flow rate of 150 sccm, negative bias voltage of 6 kV, pulse frequency of 1.5 kHz, gas pressure of 8 Pa, and processing time of 30 min.

[0071] (4) After the cleani...

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Abstract

The invention relates to a deposition system for a Si-doped multi-layer DLC coating on the surface of a special-shaped part. The deposition system comprises a vacuum chamber and a sample holder arranged in the vacuum chamber. The sample holder is arranged on a sample table, honeycomb holes are densely distributed in the upper surface of the sample table, and an air inlet is formed in the lower part of the sample table. The deposition system is characterized in that a cylindrical hollow auxiliary cathode is arranged in the vacuum chamber and on the sample table, and the sample holder is arranged in the auxiliary cathode. Meanwhile, the invention further discloses a deposition method of the deposition system. High-density plasmas are generated inside through the hollow cathode effect, a complex workpiece can be completely immersed, so that the Si-doped multi-layer DLC coating is uniformly deposited on the surface of the special-shaped workpiece in an all-around mode, the prepared Si-doped multi-layer DLC coating has good binding force and excellent wear-resisting and corrosion-resisting performance , the service life of the workpiece can be effectively prolonged, and great industrial application value is achieved.

Description

technical field [0001] The invention relates to the technical field of protective coatings, in particular to a deposition system and method for Si-doped multilayer DLC coatings on the surface of special-shaped parts. Background technique [0002] Diamond-like Carbon (DLC) films are widely used in aerospace, marine It is a kind of protective coating with great potential in the fields of corrosion, mechanical engineering and biomedicine. In addition, DLC coatings can be obtained by doping metal (Al, Cr, Ti, Ni, Cu, Ag, W, Pt, Pd) and non-metal (H, B, Si, F, S, N, O) elements Some specific properties, such as high temperature resistance, radiation resistance, etc. Usually application-specific workpieces are not simple planar shapes, so it is very necessary to deposit DLC coatings quickly, economically and greenly on workpieces with complex shapes. [0003] Generally, the deposition technology of DLC coating on the surface of special-shaped parts is divided into two categorie...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C16/515C23C16/24C23C16/02
CPCC23C16/26C23C16/515C23C16/24C23C16/0245
Inventor 张广安魏徐兵曹学乾李东山
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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