Unlock instant, AI-driven research and patent intelligence for your innovation.

Laminated body, composition, and laminated-body formation kit

A technology of laminates and compositions, applied in the direction of coatings, photosensitive materials for optomechanical equipment, instruments, etc., can solve the problem of slowing down the dissolution rate of the developer, and achieve the effect of excellent pattern shape

Pending Publication Date: 2021-10-29
FUJIFILM CORP
View PDF30 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In addition, Patent Document 2 discloses a laminate comprising an organic semiconductor film, a protective film on the organic semiconductor film, and a resist film on the protective film, wherein the resist film is made of a photosensitive resin. A composition is formed, and the photosensitive resin composition comprises: a photoacid generator (A), which generates an organic acid whose pKa is -1 or less; and a resin (B), which reacts to the acid generated by the photoacid generator. , so that the dissolution rate for a developer containing an organic solvent is reduced

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Laminated body, composition, and laminated-body formation kit
  • Laminated body, composition, and laminated-body formation kit
  • Laminated body, composition, and laminated-body formation kit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0628] Hereinafter, an Example is given and this invention is demonstrated further concretely. Materials, usage amounts, proportions, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed without departing from the gist of the present invention. In addition, unless otherwise specified, "%" and "part" are based on mass.

[0629] The weight average molecular weight (Mw) of water-soluble resins, such as polyvinyl alcohol, is calculated by the polyether oxide conversion value measured by GPC. HLC-8220 (manufactured by TOSOH CORPORATION) was used as the device, and SuperMultiporePW-N (manufactured by TOSOH CORPORATION) was used as the column.

[0630] The weight average molecular weight (Mw) of water-insoluble resins, such as a (meth)acrylic resin, is calculated by the polystyrene conversion value measured by GPC. HLC-8220 (manufactured by TOSOH CORPORATION) was used as an apparatus, and TSKgelSuper AWM-H (manufactur...

Synthetic example 1

[0633]

[0634] 70g of 1-n-butoxynaphthalene and 200g of phosphorus pentoxide-methanesulfonic acid mixture were put into an eggplant-shaped flask, and after stirring at room temperature for 15 minutes, 40g of tetramethylene methylene was added dropwise at 0°C. Sulfone, after stirring for 20 minutes, was slowly warmed to room temperature and stirred for a further 1 hour. Then, it was cooled to 0° C. again, 2 L of water was added, the pH was adjusted to 7.0 with 25% aqueous ammonia, and the mixture was stirred at room temperature for 1 hour. Then, a solution obtained by dissolving 110 g of difluoro(sodium sulfonate) methyladamantane-1-carbonate in 100 L of water-methanol mixture was added, stirred at room temperature for 1 hour, extracted with dichloromethane, and further Washed with water. Then, dichloromethane was distilled off under reduced pressure for purification, and 81 g of specific photoacid generator B-1 were obtained.

Synthetic example 4

[0635]

[0636] B-2 to B-6 were synthesized by the same synthesis method as that of B-1 above.

[0637] (synthesis of specific resin)

[0638] The specific resin was synthesized by the synthesis method described below.

[0639]

[0640] PGMEA (propylene glycol monomethyl ether acetate, 32.62 g) was put into the three-necked flask equipped with the nitrogen introduction pipe and the cooling pipe, and it heated up to 86 degreeC. BzMA (benzyl methacrylate, 13.23 g), THFMA (tetrahydrofuran-2-yl methacrylate, 26.72 g), t-BuMA (tert-butyl methacrylate, 3.85 g) were added dropwise thereto over 2 hours. ) and V-601 (0.4663 g, manufactured by FUJIFILM Wako Pure Chemical Corporation) dissolved in PGMEA (32.62 g). Then, the reaction liquid was stirred for 2 hours to complete the reaction. Specific resin A-1 was obtained by collecting the white powder produced by reprecipitating the reaction liquid in heptane by filtration. The weight average molecular weight (Mw) was 45,000.

[...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
surface tensionaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

Provided are: a laminated body that contains a substrate, an organic layer, a protective layer, and a photosensitive layer in this order, wherein the photosensitive layer contains an onium salt photoacid generator having an anion part that has a group containing at least one type of ring structure selected from the group consisting of a condensed ring structure, a crosslinked ring structure, and a spiro ring structure, the photosensitive layer is developed by using a developer, and the protective layer is removed by using a stripper; a composition used to form the protective layer or the photosensitive layer contained in the laminated body; and a laminated-body formation kit used to form the laminated body.

Description

technical field [0001] The present invention relates to a laminate, a composition, and a kit for forming the laminate. Background technique [0002] In recent years, devices using patterned organic layers, such as semiconductor devices using organic semiconductors, have been widely used. [0003] For example, compared to conventional devices using inorganic semiconductors such as silicon, devices using organic semiconductors have the following characteristics: they can be manufactured through simple processes, and the properties of materials can be easily changed by changing the molecular structure. Also, it is considered that the variation of materials is abundant and can realize functions or elements as cannot be realized by inorganic semiconductors. For example, organic semiconductors may be used in electronic devices such as organic solar cells, organic electroluminescent displays, organic photodetectors, organic field effect transistors, organic electroluminescent elem...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/038G03F7/039
CPCG03F7/0045G03F7/11G03F7/325G03F7/0392G03F7/0397G03F7/422C09D129/04G03F7/004G03F7/0382G03F7/066G03F7/30G03F7/32G03F7/42C08F220/1811C09D133/06G03F7/038
Inventor 中村敦高桑英希
Owner FUJIFILM CORP